Exposure equipment

Abstract

Exposure equipment (1) is provided with an exposure optical system (2) for irradiating a color filter board (6) with exposure light from a light source (7), and a transfer means (4), on which the color filter board (6) arranged to face the exposure optical system (2) is placed to be transferred at a fixed speed. The exposure equipment exposes an image on an opening part (10a) of a mask (10) arranged on an optical path of the exposure optical system (2). The exposure equipment is provided with an image pickup means (3), which performs image pickup of a black matrix (11) previously formed on the color filter board (6), having the front side of an exposure position of the exposure optical system (2) in a shifting direction of the transfer means (4) as an image pickup apposition. The equipment is also provided with a control means (5), which detects a previously set reference position in the black matrix (11) of which image has been picked up by the image picked up means (3), controls irradiation timing of the exposure light of the exposure optical system (2) with the reference position as the standard, and exposes the image of the opening part (10a) of the mask (10) at a prescribed position on the color filter board (6). Thus, the exposure equipment which performs efficient exposure to a large exposure area by using the small mask is provided.

Description

technical field [0001] The present invention relates to an exposure apparatus for exposing an image of an opening of a light-shielding plate interposed in a path of the exposure optical system on an object to be exposed by irradiating exposure light with an exposure optical system, and more specifically relates to an exposure apparatus as follows : By moving the object to be exposed at a certain speed, and at the same time taking the preset reference position of the reference pattern formed on the object to be exposed as a reference, the setting of the exposure position and the irradiation time of the exposure light are controlled. to efficiently expose over a wide exposure area. Background technique [0002] Existing exposure devices of this kind include: a stage, which holds the substrate with the photosensitive material facing upwards and can control the movement of the substrate in the X, Y, Z axial and θ directions, and can at least move the substrate in the X, Y Stepp...

AI Technical Summary

Problems solved by technology

[0004] However, in such a conventional exposure apparatus, when the exposure to a predetermined area is completed, the exposure operation is temporarily stopped, and the light shielding plate is relatively step-moved with respect to the substrate, and the positional alignment and gap adjustment between the substrate and the light shielding plate are performed again. After exposure, it takes time to perform position alignment and gap adjustment multiple times, and it takes a long time for exposure

[0005] Also, the conventional exposure apparatus can use a small-area light-shielding plate to expose a predetermined pattern on the entire surface of a large substrate. Therefore, it has the advantage of reducing the cost of the light-shielding plate used, but it also has the following problems: the light-shielding plate The smaller the area, the more times the position alignment and gap adjustments will be, and the adjustment time will increase correspondingly, so that the exposure time will be longer

[0006] In addition, in order to shorten the time for alignment and gap adjustment, when a large light shield is used to a certain extent, a large amount of energy is required for the exposure light, and since the power of the light source is limited, it is necessary to lengthen the irradiation time of the exposure light. As a result, the exposure time cannot be shortened either.

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