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Two-photon polymerization high-power exposure method and system for galvanometer-assisted cyclic scanning

A technology of two-photon polymerization and auxiliary circulation, applied in laser welding equipment, welding equipment, metal processing equipment, etc., can solve the problem of low two-photon polymerization processing efficiency, achieve high-efficiency mass manufacturing, solve low processing efficiency, high efficiency The effect of exposure

Pending Publication Date: 2022-01-11
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a two-photon polymerization high-power exposure method and system with scanning galvanometer-assisted circular scanning to solve the problem of low processing efficiency of two-photon polymerization

Method used

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  • Two-photon polymerization high-power exposure method and system for galvanometer-assisted cyclic scanning
  • Two-photon polymerization high-power exposure method and system for galvanometer-assisted cyclic scanning
  • Two-photon polymerization high-power exposure method and system for galvanometer-assisted cyclic scanning

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Embodiment 1

[0045] A two-photon polymerization high-power exposure method for galvanometer-assisted circular scanning, specifically comprising the following steps:

[0046] Step 1: The substrate coated with photoresist is used as the sample 11, placed on the support 10, the illumination source 12 is placed under the sample 11, the support 10 and the illumination source 12 are fixed on the x-direction movement axis 13 by screws On the motion table of the x-direction motion axis 13 is fixed on the motion table of the y-direction motion axis 14; through the output signal of the industrial computer 16, the motion table of the x-direction motion axis 13 and the y-direction motion axis 14 is controlled to drive the sample 11 respectively Moving along the x-direction and y-direction, the two scanning galvanometers 4, the mirror 5, the 4F system 6, the beam splitter 7, the focusing objective lens 9 and the camera 15 are all mounted on the moving platform of the z-direction movement axis 8 by screw...

Embodiment 2

[0078] A two-photon polymerization high-power exposure method for galvanometer-assisted circular scanning, specifically comprising the following steps:

[0079] In step 1, the Ormocer photoresist is coated on the glass substrate as the sample 11, and the bracket 10 has through holes. The sample 11 is placed on the support 10 with the side coated with photoresist facing down. A yellow illuminating light source 12 is placed under the sample 11 . The bracket 10 and the illumination source 12 are fixed on the moving platform of the x-direction moving axis 13 by screws. The x-direction movement axis 13 is fixed on the movement table of the y-direction movement axis 14 . The scanning galvanometer 4, the mirror 5, the 4F system 6, the beam splitter 7, the focusing objective lens 9 and the CCD camera 15 are installed on the moving platform of the z-direction moving axis 8 by screws. Adjust the angle and position of each component so that the laser beam can pass through smoothly. L...

Embodiment 3

[0096] Such as figure 2 As shown, this embodiment provides a two-photon polymerization high-power exposure system with galvanometer-assisted circular scanning, including a 780nm-800nm ​​wavelength laser 1, a laser beam 2, an optical mirror group 3, a scanning galvanometer 4, a mirror 5, 4F system 6, beam splitter 7, z-direction movement axis 8, focusing objective lens 9, bracket 10, sample 11, 577-597nm yellow illumination source 12, x-direction movement axis 13, y-direction movement axis 14, CCD camera 15 and Industrial computer 16; the laser beam 2 is emitted by the laser 1, attenuated and expanded by the optical mirror group 3, reflected by the reflector 5 and injected into the scanning vibrating mirror 4, passing through the 4F system 6, the beam splitter 7, the focusing Behind the objective lens 9, it focuses on the inside of the sample 11; the sample 11 is placed on the support 10, and the illumination source 12 is placed under the sample 11, and the support 10 and the ...

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Abstract

The invention discloses a two-photon polymerization high-power exposure method and system for galvanometer-assisted cyclic scanning, and belongs to the technical field of ultrafast laser micromachining. According to the two-photon polymerization high-power exposure method, deflection of two reflectors in a scanning galvanometer is utilized to enable a laser focus to always perform rapid cyclic circular motion with the speed higher than a polymerization speed threshold value in a sample piece, so that overexposure of the laser focus in the material is avoided. Meanwhile, an xy-direction motion platform is used for driving the sample piece to perform rapid planar motion. Low-speed polymerization of the laser focus relative to the sample piece is realized through a speed compensation stage in which the movement speed of the laser focus in each cycle period is the same as the speed direction of the sample piece. A z-direction motion platform drives the sample piece to realize z-direction superposition manufacturing. The two-photon polymerization high-power exposure method can effectively avoid overexposure of the laser focus due to short-time staying in the start-stop stage under the condition of high power, solves the problem that two-photon polymerization rapid scanning is limited by material polymerization reaction time, is easy to implement, and can realize efficient processing of two-photon polymerization.

Description

technical field [0001] The invention belongs to the technical field of ultrafast laser micromachining, and in particular relates to a two-photon polymerization high-power exposure method and system for galvanometer-assisted circular scanning. Background technique [0002] Ultrafast lasers operate in the form of pulses, with the characteristics of very short pulse duration and high instantaneous power, and various nonlinear optical effects will be generated during the interaction with matter. Using these nonlinear effects, it is theoretically possible to realize structural processing and physical property control of any material. Femtosecond laser two-photon polymerization technology has shown great technical advantages in the field of arbitrary complex three-dimensional micro-nano functional devices, and has important applications in many important fields such as aerospace, precision guidance, infrared remote sensing, military reconnaissance, and biomedicine. The micro-nano...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/00B23K26/046B23K26/082
CPCB23K26/00B23K26/046B23K26/082
Inventor 陈岐岱靖贤孙洪波
Owner JILIN UNIV
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