286results about How to "Stable rate" patented technology

A mutant hydrolase optionally fused to a protein of interest is provided. The mutant hydrolase is capable of forming a bond with a substrate for the corresponding nonmutant (wild-type) hydrolase which is more stable than the bond formed between the wild-type hydrolase and the substrate and has at least two amino acid substitutions relative to the wild-type hydrolase. Substrates for hydrolases comprising one or more functional groups are also provided, as well as methods of using the mutant hydrolase and the substrates of the invention. Also provided is a fusion protein capable of forming a stable bond with a substrate and cells which express the fusion protein.

A method for vaporizing organic material and condensing it onto a surface to form a layer, comprising: providing a quantity of first organic material in a powdered form in a first container and a quantity of second organic material in a second container spaced from the first container; fluidizing the first organic material in the first container, transferring the fluidized first organic material from the first container into a manifold, and vaporizing the first organic material in the manifold; fluidizing the second organic material in the second container, transferring the fluidized second organic material from the second container into the manifold, and vaporizing the second organic material in the manifold where the first and second vaporized organic materials are mixed; and delivering from the manifold the mixed vaporized materials to the substrate surface to form the layer.

A client device presents streaming media and includes a stream manager, a request accelerator, and a source component coupled to the stream manager and the request accelerator for determining which requests to make. A rate selection process can make rate decisions so that the buffer is filled when it is low, avoiding erratically changing rates and can choose the correct steady rate quickly. Multimedia download strategies can be used for HTTP that allow for accurate rate estimations, achieving link capacity even if network delays and packet loss rates are high, achieving timely delivery of the stream, and achieving relatively steady download rates with little short term variability. A receiver might use multiple HTTP connections, decompose media requests into smaller chunk requests, synchronize the connections using TCP flow control mechanisms, and request data in bursts. In addition, the receiver might use an HTTP pipelining process to keep the connections busy.

In a polishing apparatus, a polishing tool including abrasive particles and a binder for bonding together the abrasive particles is pressed against a substrate to polish the substrate. The polishing apparatus has a light source for irradiating a polishing surface with light rays for weakening a bond force of the binder for bonding together the abrasive particles, and a waste matter removing mechanism for forcefully removing waste matter produced by polishing or waste matter produced by irradiation. By irradiating the polishing surface with the light rays, dressing of the polishing surface is performed, and products resulting from dressing and the like are removed. The polishing apparatus supplies abrasive particles to the polishing surface stably by dressing and allows high-speed polishing of the substrate.

A method for editing motion of a character includes steps of a) providing an input motion of the character sequentially along with a set of kinematic and dynamic constraints, wherein the input motion is provided by a captured or animated motion; b) applying a series of plurality of unscented Kalman filters for solving the contraints; c) processing the output from the unscented Kalman filters with a least-squares filter for rectifying the output; and d) producing a stream of output motion frames at a stable interactive rate. The steps are applied to each frame of the input motion The method may further include a step of controlling the behavior of the filters by tuning parameters and a step of providing a rough sketch for the filters to produce a desired motion. The Kalman filter includes per-frame Kalman filter. The least-squares filter is applied only to recently processed frames

A method for vaporizing organic materials onto a substrate surface to form a film including providing a quantity of organic material into a vaporization apparatus and actively maintaining the organic material in a first heating region in the vaporization apparatus to be below the vaporization temperature. The method also includes heating a second heating region of the vaporization apparatus above the vaporization temperature of the organic material and metering, at a controlled rate, organic material from the first heating region into the second heating region so that a thin cross section of the organic material is heated at a desired rate-dependent vaporization temperature, whereby organic material vaporizes and forms a film on the substrate surface.

An ejector for a fuel cell system of the present invention includes a nozzle having a nozzle hole for discharging hydrogen supplied via an inlet port of an ejector body, a diffuser for mixing hydrogen discharged from the nozzle hole and hydrogen off-gas discharged and returned via a circulation passage from a fuel cell, a needle displacing in the axial direction by a driving force of a solenoid, and a bearing member held in a hollow portion of the nozzle, and having a through hole that movably supports the needle in the axial direction.

The subject is to provide a polymer material which enables to improve planarity and planarization efficiency of a polished surface and is useful as a polishing pad which generates only a few scratches. The said subject is solved by a polymer material having a tensile modulus at 50° C. after saturation swelling with 50° C. water of 130 to 800 MPa, a loss tangent at 50° C. of not more than 0.2, and a contact angle with water of not more than 80°.

The invention discloses a silicon wafer chemical and mechanical polishing composition with high stability, belonging to the technical field of polishing compositions for roughlly polishing a semiconductor silicon substrate material. The polishing composition comprises the following components in percentage by weight: 0.5-50 percent of silicon dioxide abrasive particles, 0.01-10 percent of silicon-containing stabilizer, 0.01-20 percent of organic alkali corrosive, 0.01 -10 percent of organic acid chelating agent, 0.01-5.0 percent of other functional auxiliaries and the balance of deionized water. The polishing solution has a stabilization period of over 2 years, can perform repeated polishing or cyclic polishing, and has stable pH value and removal speed, wherein the number of cyclic polishing times can be up to 10. Meanwhile, the polishing composition has high silicon wafer removal rate up to over 1.0 mum/min, and the cyclic polishing removal rate in multiple times can be stable. The polishing solution is convenient to prepare and easy to use, has low cost, and is suitable for the rough polishing of silicon wafers of various types and sizes in the semiconductor industry.

The present invention relates to a polishing pad which is characterized in that it is of micro rubber A-type hardness at least 80°, has closed cells of average cell diameter no more than 1000 mum, is of density in the range 0.4 to 1.1 and contains polyurethane and polymer produced from a vinyl compound. When planarizing local unevenness on a semiconductor substrate with the polishing pad relating to the present invention, the polishing rate is high, the global step height is low, dishing does not readily occur at the metallic interconnects, clogging and permanent set of the surface layer region do not readily occur and the polishing rate is stable.

A heat-resistant alloy spring is made of a Ni-based alloy material comprising in weight %: not more than 0.1% C; not more than 1.0% Si; not more than 1.50% Mn; 13.0 to 25.0% Cr; 1.5 to 7.0% Mo; 0.5 to 4.0% Ti; 0.1 to 3.0 % Al; {at least one optional element selected from the group consisting of 0.15 to 2.50% w, 0.001 to 0.020% B, 0.01 to 0.3% Zr, 0.30 to 6.00% Nb, 5.0 to 18.0% Co, and 0.03 to 2.00% Cu}; the balance being essentially Ni; and incidental impurities. The Ni-based alloy material is provided in its crystal structure with gamma prime phase [Ni₃(Al, Ti)] or gamma prime phase [Ni₃(Al, Ti, Nb)]. The gamma prime phase has an average grain diameter (d) of not less than 25 nanometers, and a hardness-diameter ratio (Hv/d) of a Vickers hardness Hv of a position at a depth of one-fourth of the entire thickness or the wire diameter from a surface of the Ni-based alloy material toward its center and the average grain diameter d(nanometer) is 5 to 25. The Ni-based alloy wire used as the Ni-based alloy material has a Hv hardness of 320 to 480 and a longitudinal elastic modulus of 150,000 to 230,000 N/sq.mm.

The subject matter disclosed herein provides methods for presenting glucose level data. Glucose data for a patient may be received. A current glucose level and a rate of change of the current glucose level may be determined based on the received glucose data. A first interface may be displayed on a screen of a device. The first interface may include a unitary icon. The unitary icon may display the current glucose level and a visualization of the rate of change. Related apparatus, systems, techniques, and articles are also described.

The present invention provides an apparatus for heating or cooling a polishing surface. This apparatus includes a heat exchanger arranged so as to face the polishing surface when the workpiece is polished. The heat exchanger includes a medium passage through which a heat-exchanging medium flows, and a bottom surface facing the polishing surface. At least a part of the bottom surface is inclined with an upward gradient above the polishing surface such that a polishing liquid on the polishing surface generates a lift exerted on the bottom surface during movement of the polishing surface.