The invention discloses a feeding cylinder structure of
photoresist to a photoetching
machine. The feeding cylinder structure comprises a tray, wherein a
photoresist containing cylinder is placed on the tray, lugs are formed at the two opposite sides of the tray, vertical connecting pillars are fixed to the lugs, vertical studs are formed on the upper end faces of the connecting pillars, an annular protection hood is formed on the upper end face of the tray, and the
photoresist containing cylinder is inserted in the protection hood; a sealing cover is inserted in the upper end of the photoresist containing cylinder, a lock catch plate is formed on the upper end face of the sealing cover, the two ends of the lock catch plate stretch out of the photoresist containing cylinder and are inserted in and sleeve the studs, and nuts are in
screw joint with the studs, and press and abut against the lock catch plate, a conveying
pipe is inserted in and fixed to the sealing cover, and the lower end of the conveying
pipe is inserted in the bottom of the photoresist containing cylinder.