The present invention relates to a plasma cleaning apparatus for cleaning semiconductor components through plasma discharge during a semiconductor manufacturing process and, more specifically, to a semiconductor plasma cleaning apparatus for performing, in the same magazine at one place, loading of semiconductor components, which are to be cleaned, accommodated within a magazine through a rotary stage, and unloading of the cleaned semiconductor components. The present invention comprises: a magazine table (100) for lifting a magazine (M), in which a plurality of semiconductor components (A) are loaded at predetermined intervals, in steps according to a cleaning progress state; a rotary stage (200) provided at the rear of the magazine table so as to rotate in the horizontal direction; a plasma cleaning chamber (300) descending to the rotary stage so as to clean the semiconductor components supplied to the rotary stage; a first transfer member (400) located at the front of the magazine table so as to push and move, in the backward direction whenever the magazine rises in steps, the semiconductor components, which are to be cleaned, loaded inside the magazine; and a second transfer member (500) provided to rise at the upper part of the rotary stage and to move in the forward and backward directions such that the semiconductor components, which are to be cleaned, moved in the backward direction through the first transfer member are picked up, thereby supplying the semiconductor components to the rotary stage or loading the semiconductor components in the magazine, in steps, by pushing, to the magazine table, the cleaned semiconductor components located at the upper part of the rotary stage.