Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

359results about "Gas discharge filling" patented technology

Light emitting device

A blue-emitting phosphor is optimized by controlling mole fractions typically of Mg and Si in Sr3-eMgbSi2cO8d:Eue or by further including an optimal amount of at least one additional component such as Ba or Ca. The resulting phosphor exhibits a higher brightness and a higher color purity upon excitation by ultraviolet light emitted as a result of discharge of xenon gas. The optimized phosphor is incorporated into light emitting devices such as lamps and PDPs, and further into display devices.
Owner:HITACHI LTD

Display device employing gas discharge tubes arranged in parallel between front and rear substrates to comprise a display screen, each tube having a light emitting section as part of the display screen and a cleaning section connected to the light emitting section but displaced from the display screen

InactiveUS7049748B2Deterioration of discharge characteristic is preventedInhibit deteriorationAddress electrodesSustain/scan electrodesFluorescencePhosphor
A gas discharge tube has a phosphor layer formed and a discharge gas enclosed within an elongated tube which is to serve as the gas discharge tube. The gas discharge tube includes a light-emitting section and a cleaning section for cleaning the discharge gas. The cleaning section is connected to the light-emitting section.
Owner:SHINODA PLASMA

Plasma display panel

A plasma display panel. A first substrate and a second substrate are provided opposing one another with a predetermined gap therebetween. Address electrodes are formed on the second substrate. Barrier ribs are mounted between the first substrate and the second substrate, the barrier ribs defining a plurality of discharge cells and a plurality of non-discharge regions. Phosphor layers are formed within each of the discharge cells. Discharge sustain electrodes are formed on the first substrate. The non-discharge regions are formed in areas encompassed by discharge cell abscissas that pass through centers of adjacent discharge cells and discharge cell ordinates that pass through centers of adjacent discharge cells, the non-discharge regions having a width that is at least as large as a width of an end of barrier ribs. Also, a transverse barrier rib is formed extending between each pair of adjacent rows of discharge cells.
Owner:SAMSUNG SDI CO LTD

Plasma display panel and manufacture method thereof

The present invention relates to a plasma display panel and a manufacture method thereof in which a color mixture of emitted light can be prevented and a contrast characteristic can be improved. The plasma display panel includes: a first barrier rib for partitioning a plurality of sub-pixels; and a second barrier rib formed to function as a boundary between one unit pixel constituting of the plurality of sub-pixels and an adjacent unit pixel, and partition the unit pixels, wherein the second barrier rib has a greater width than the first barrier rib. The method includes the steps of: coating a first and second barrier rib paste on a dielectric material formed on a glass; and placing and exposing an irregular pattern mask on the first and second barrier rib paste to form a first barrier rib pattern and a second barrier rib pattern each having a different width.
Owner:LG ELECTRONICS INC

Plasma display panel and method of manufacturing the same

A plasma display panel, and a method of manufacturing the same, including a substrate, barrier ribs formed on the substrate and defining discharge cells and non-discharge cells, the barrier ribs including first, second and third barrier rib members, wherein the discharge cells are defined by the first and second barrier rib members, the second barrier rib members perpendicular to and intersecting the first barrier rib members, the non-discharge cells are defined by the second and third barrier rib members, wherein the third barrier rib members are located between columns of the discharge cells and are disposed parallel to the first barrier rib members, and a cross-sectional area of at least one third barrier rib member is greater at a bottom portion of the at least one third barrier rib member than at a top portion thereof.
Owner:SAMSUNG SDI CO LTD

Processing gas supplying mechanism, supplying method and gas processing unit

The invention relates to a treatment gas supplying mechanism, supplying method and gas treatment device, wherein the treatment gas supplying mechanism supplies treatment gas for making the treatment container at preset pressure in short time. The treatment gas supplying mechanism (3) comprises: a He gas supply resource (30) for supplying helium gas as treatment gas to a chamber (2) as treatment container of holding substrate; a treatment gas jar (33) for temporarily storing helium gas from the He gas supply resource (30); a treatment gas circulating parts (35) for supplying helium gas from the He gas supply resource (30) to the treatment gas jar (33) and supplying the helium gas from the treatment gas jar (33) to chamber (2), wherein the helium gas is temporarily stored in the treatment gas jar (33) from the He gas supply resource (30) through the treatment gas circulating parts (35) and supplied to the chamber (2) from the treatment gas jar (33).
Owner:TOKYO ELECTRON LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products