32 results about "Nanostructure fabrication" patented technology

The present invention generally relates to nanoantenna arrays and methods of their fabrication. In particular, one aspect relates to nanoantenna arrays comprising nanostructures of predefined shapes in predefined patterns, which results in collective excitement of surface plasmons. In some embodiments the nanoantenna arrays can be used for spectroscopy and nanospectroscopy. Another aspects of the present invention relate to a method of high-throughput fabrication of nanoantenna arrays includes fabricating a reusable nanostencil for nanostensil lithography (NSL) which provides a mask to deposit materials onto virtually any support, such as flexible and thin-film stretchable supports. The nanostencil lithography methods enable high quality, high-throughput fabrication of nanostructures on conducting, non-conducting and magnetic supports. The nanostencil can be prepared by etching nanoapertures of predefined patterns into a waffer or ceramic membrane. In some embodiments, a nanoantenna array comprises plasmonic nanostructures or non-plasmonic nanostructures.

Nanostructure manufacturing methods and methods for assembling nanostructures into functional elements such as junctions, arrays and devices are provided. Systems for practicing the methods are also provided.

Probe-based methods are provided for formation of one or more nano-sized or micro-sized elongated structures such as wires or tubes. The structures extend at least partially upwards from the surface of a substrate, and may extend fully upward from the substrate surface. The structures are formed via a localized electrodeposition technique. The electrodeposition technique of the invention can also be used to make modified scanning probe microscopy probes having an elongated nanostructure at the tip or conductive nanoprobes. Apparatus suitable for use with the electrodeposition technique are also provided.

Semiconductor structures and method of forming semiconductor structures. The semiconductor structures including nano-structures or fabricated using nano-structures. The method of forming semiconductor structures including generating nano-structures using a nano-mask and performing additional semiconductor processing steps using the nano-structures generated.

Probe-based methods are provided for formation of one or more nano-sized or micro-sized elongated structures such as wires or tubes. The structures extend at least partially upwards from the surface of a substrate, and may extend fully upward from the substrate surface. The structures are formed via a localized electrodeposition technique. The electrodeposition technique of the invention can also be used to make modified scanning probe microscopy probes having an elongated nanostructure at the tip or conductive nanoprobes. Apparatus suitable for use with the electrodeposition technique are also provided.

The present invention relates to methods of fabricating nanostructures using a replacement reaction. In a preferred embodiment, metal particles in an inert atmosphere undergo a replacement reaction to form a layer on the metal particle which is removed to form a high surface area nanostructure. A preferred embodiment includes the fabrication of heater elements, powders and heater assemblies using the nanostructures.

This invention relates to photovoltaic devices made with photoactive nanostructures comprising carbon nanotubes and photosensitive nanoparticles.

The present invention relates to tools and system designs for chemical vapor deposition (CVD) systems and CVD synthesis used to deposit one or more thin film layers onto a flexible substrate or to grow nano-structured materials on large area flexible substrates and, more particularly, to scalable CVD coating and nanostructure manufacturing including CVD thin films and nano-structured materials such as nanotubes, nanowires and nanosheets.

The present invention relates to the formation and processing of nanostructures including nanotubes. Some embodiments provide processes for nanostructure growth using relatively mild conditions (e.g., low temperatures). In some cases, methods of the invention may improve the efficiency (e.g., catalyst efficiency) of nanostructure formation and may reduce the production of undesired byproducts during nanostructure formation, including volatile organic compounds and / or polycylic aromatic hydrocarbons. Such methods can both reduce the costs associated with nanostructure formation, as well as reduce the harmful effects of nanostructure fabrication on environmental and public health and safety.

Disclosed is a nano-structure manufacturing method which includes: forming a first semiconductor composite layer, a semiconductor quantum structure layer, a second semiconductor composite layer, and a semiconductor quantum dot layer on a substrate in order; thermally treating the semiconductor quantum dot layer so that quantum dots of the semiconductor quantum dot layer are aggregated; and performing an etching process by using the aggregated quantum dots as a mask.

The invention provides a nanostructure manufacturing method, a magnetic disk manufacturing method, a stamper forming method and a matrix generating method. The nanostructure manufacturing method comprises the steps of: forming a particle layer on the substrate by spreading at least one layer of nanoscale particles made of a material different from that of the nanoscale flat substrate; forming a holding layer on the particle layer. a body that holds the particle layer by being closely bonded to particles forming the particle layer; and removing the substrate in such a manner that the particle layer remains intact.

Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.

A composite material can include a gel and at least one nanostructure disposed within the gel. A method for healing a soft tissue defect can include applying a composite material to a soft tissue defect, wherein the composite material includes a gel and a nanostructure disposed within the gel. A method for manufacturing a composite material for use in healing soft tissue defects can include providing a gel and disposing nanofibers within the gel.

The present invention relates to tools and system designs for chemical vapor deposition (CVD) systems and CVD synthesis used to deposit one or more thin film layers onto a flexible substrate or to grow nano-structured materials on large area flexible substrates and, more particularly, to scalable CVD coating and nanostructure manufacturing including CVD thin films and nano-structured materials such as nanotubes, nanowires and nanosheets.

A composite material can include a gel and at least one nanostructure disposed within the gel. A method for healing a soft tissue defect can include applying a composite material to a soft tissue defect, wherein the composite material includes a gel and a nanostructure disposed within the gel. A method for manufacturing a composite material for use in healing soft tissue defects can include providing a gel and disposing nanofibers within the gel.

Disclosed is a nano-structure manufacturing method which includes: forming a first semiconductor composite layer, a semiconductor quantum structure layer, a second semiconductor composite layer, and a semiconductor quantum dot layer on a substrate in order; thermally treating the semiconductor quantum dot layer so that quantum dots of the semiconductor quantum dot layer are aggregated; and performing an etching process by using the aggregated quantum dots as a mask.

The invention discloses a splicing laser interference lithography equipment suitable for the manufacture of large-area nanometer structures, which is composed of a main body, a laser light wave supply unit installed on the main body, a reflection mechanism, an L-shaped fixing mechanism and a substrate carrier; The radiation wave supply unit includes a laser light source generator, a shutter, a pinhole and a lens; the reflection mechanism includes a three-dimensional movable bracket and a second reflector, the second reflector is installed on the three-dimensional movable bracket, and the second reflector corresponds to the lens and accepts the laser beam. emit light waves; the L-shaped fixing mechanism consists of a vertical fixing seat, a first reflector, a horizontal fixing seat and a photomask. The table includes an X-direction shaft seat, an X-direction moving shaft, an X-direction driving mechanism, a Y-direction shaft seat, a Y-direction moving shaft, a Y-direction driving mechanism and a substrate clamp, and the position of the substrate clamp is lower than the horizontal fixed seat. The invention makes the exposure system more stable.