Splicing laser interference lithography equipment suitable for large-area nanostructure fabrication

Abstract

The invention discloses a splicing laser interference lithography equipment suitable for the manufacture of large-area nanometer structures, which is composed of a main body, a laser light wave supply unit installed on the main body, a reflection mechanism, an L-shaped fixing mechanism and a substrate carrier; The radiation wave supply unit includes a laser light source generator, a shutter, a pinhole and a lens; the reflection mechanism includes a three-dimensional movable bracket and a second reflector, the second reflector is installed on the three-dimensional movable bracket, and the second reflector corresponds to the lens and accepts the laser beam. emit light waves; the L-shaped fixing mechanism consists of a vertical fixing seat, a first reflector, a horizontal fixing seat and a photomask. The table includes an X-direction shaft seat, an X-direction moving shaft, an X-direction driving mechanism, a Y-direction shaft seat, a Y-direction moving shaft, a Y-direction driving mechanism and a substrate clamp, and the position of the substrate clamp is lower than the horizontal fixed seat. The invention makes the exposure system more stable.

Description

technical field [0001] The invention relates to a splicing laser interference lithography equipment suitable for making large-area nanostructures, and is suitable for the processing and manufacturing fields of semiconductors, LEDs, MEMS and 3C. Background technique [0002] With the development of various semiconductor, micro-electromechanical, display and solid-state lighting technologies, the requirements for lithography technology tend to develop towards large-scale and graphic miniaturization; taking high-brightness blue and white light-emitting diodes (LEDs) as examples, patterned sapphire The adoption of (PSS) substrates has occupied the mainstream position, and the related technology, especially the lithography part, has played a technical bottleneck and is also the key to development. [0003] The traditional process of using a photomask with an exposure stepper (stepper) encounters challenges when the size of the substrate is increasing, especially the flatness and ...

AI Technical Summary

Problems solved by technology

The two important lithography technologies of NPSS are nanoimprint (nanoimprint) and laser interference lithography (laser interference lithography, LIL). In the design of traditional laser interference lithography equipment, the Lloyd-mirror system is mainly used. , the substrate is fixed upright, therefore, the mobile platform carrying the substrate is easily affected by gravity, causing the exposure system to be unstable

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