The invention is directed to an arrangement for metering target material for the generation of short-
wavelength electromagnetic radiation from an energy beam induced
plasma, in particular X
radiation and EUV
radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-
wavelength electromagnetic radiation from an energy beam induced
plasma which makes it possible to provide reproducibly supplied
mass-limited targets in such a way that only the amount of target material for
plasma generation that can be effectively converted to radiating plasma in the desired
wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized. This object is met, according to the invention, in that an
injection device is provided for target generation, wherein means are arranged upstream of the
nozzle in a
nozzle chamber for a defined, temporary
pressure increase in order to introduce an individual target into the interaction chamber exclusively when required, and an
antechamber is arranged around the
nozzle for generating a quasistatic pressure upstream of the interaction chamber, wherein an equilibrium pressure in the
antechamber prevents the escape of target material as long as there is no
pressure increase in the nozzle chamber.