The invention relates to a
sputtering target and the preparation method thereof, wherein the
sputtering target comprises a matrix material containing a first
oxide of high
refractive index and metallic components. The first
oxide is selected from the group composed of
titanium oxides of any variant forms,
niobium oxides of any variant forms,
vanadium oxides of any variant forms,
yttrium oxides of any variant forms,
molybdenum oxides of any variant forms,
zirconium oxides of any variant forms,
tantalum oxides of any variant forms,
tungsten oxides of any variant forms,
hafnium oxides of any variant forms, and the mixture thereof. The composition also contains a second
oxide is selected from the group composed of lanthanides oxides of any variant forms,
scandium oxides of any variant forms, and
lanthanum oxides of any variant forms. The matrix material has apertures, and the
sputtering target is applied for sputtering under
high power density.