The invention provides a
laser etching preparation method for a surface array
microstructure on the basis of a curved surface workpiece appearance. The method includes the steps that the free curved surface workpiece appearance to be processed is measured by the adoption of a
reverse engineering method in a modeling mode, and design
graph layout of the surface array
microstructure is conducted on the basis of a reconstructed curved surface model; then,
laser etching processing path planning is conducted on a design graph, the spatial orientation of a
laser processing head relative to a free curved surface workpiece is adjusted according to a tangent plane where a
processing path is located, a geometric center point and a corresponding outer-normal vector,
laser beams are reflected to the free curved surface workpiece in the normal direction, and
laser etching processing is conducted on geometric lines one by one. According to the method, it can be effectively guaranteed that the focus of the
laser beams is located on the surface of the free curved surface workpiece all the time in the processing procedure or a certain defocusing distance exists between the focus of the
laser beams and the surface of the free curved surface workpiece, a brand new accurate focusing
laser processing method is provided,
layout and processing errors of the surface array
microstructure graph are completely eliminated, and accuracy and stability of
laser etching processing technical quality are ensured.