Surface treatment method for improving corrosion resistance and anti-icing performance of titanium alloy surface
A surface treatment, titanium alloy technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of poor bonding force of alloy layer, difficult construction of surface micro-rough structure, etc. The effect of avoiding allotropic transformation and protecting the properties of the matrix
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Embodiment 1
[0055] Embodiment 1: alloy material preparation
[0056] (1) Before installing the Ni-Cu-Y target, polish it with 1# sandpaper to remove the oxide layer, clean it ultrasonically in absolute ethanol and dry it;
[0057] (2) The base material is cast TC4 alloy. Using wire electric discharge cutting technology, the base is made into a sample with a size of 15mm×15mm×4mm, and then coded as 0#, 01#, 03#, 05#, 07# After sanding, polish with 2.5 μm diamond paste. After ultrasonic cleaning with acetone solution, dry for later use;
[0058] (3) A plasma etching system is used to carry out ion etching with argon gas to construct a large number of defective alloy surfaces. The etching process parameters are as follows: power 2000W, argon gas flow rate 12mL / min, pressure 10KPa, time 1h;
[0059] (4) Using the double-glow plasma surface metallurgy method, put the TC4 alloy and Ni-Cu-Y alloy target into the double-glow plasma surface alloying device, use the titanium alloy as the workpiec...
Embodiment 2
[0065] Embodiment 2: alloy material preparation
[0066] (1) Before installing the Ni-Cu-Y target, polish it with 1# sandpaper to remove the oxide layer, clean it ultrasonically in absolute ethanol and dry it;
[0067] (2) The base material is cast TC18 alloy. Using wire electric discharge cutting technology, the base is made into a sample with a size of 15mm×15mm×4mm, and then coded as 0#, 01#, 03#, 05#, 07# After grinding with sandpaper, polish with 2.5 μm diamond abrasive paste, ultrasonically clean with acetone solution, and dry for later use;
[0068] (3) A plasma etching system is used to carry out ion etching with argon gas to construct a large number of defective alloy surfaces. The etching process parameters are as follows: power 2000W, argon gas flow rate 15mL / min, pressure 12KPa, time 0.7h;
[0069] (4) Using the double-glow plasma surface metallurgy method, put the titanium alloy and Ni-Cu-Y alloy target into the double-glow plasma surface alloying device, use the...
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