Heat-resistant copper foil and method for producing same, circuit board, and copper-clad laminate board and method for manufacturing same
A technology of heat resistance and copper foil, which is applied in the direction of printed circuit manufacturing, printed circuit, printed circuit, etc., to achieve excellent high-frequency characteristics, high heat-resistant adhesion, and excellent effects of copper foil
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Embodiment 1
[0064] The following copper foil (electrodeposited copper foil manufactured by Furukawa Electric Co., Ltd.) was used, which was an untreated electrodeposited copper foil with a thickness of 0.035 mm produced under known electrolytic foil production conditions, and the shape of the matte surface side (plating liquid surface side) was rough. The thickness is 1.8 μm in terms of the Rz value specified in JIS-B-0601, and its elongation at normal temperature is 6.2%. On the matte side, surface treatment is applied under the following conditions.
[0065] [Primary Copper Roughening Particle Formation Bath Composition and Treatment Conditions]
[0066] Use copper sulfate, calculated as metallic copper 23.5g / l
[0067] Sulfuric acid·····100g / l
[0068] Use sodium molybdate, calculated as molybdenum 0.25g / l
[0069] Hydrochloric acid, calculated as chloride ion 0.002g / l
[0070] Ferrous sulfate, calculated as metallic iron... 0.20g / l
Embodiment 2
[0098] Using the untreated copper foil used in Example 1, the same roughening and surface treatment as in Example 1 were performed so that the roughness of the obtained surface treatment side was about 2.0 μm in terms of Rz value, and the same as in Example 1 was performed. Evaluation assay. The results are shown in Table 1.
Embodiment 3
[0100] Using the untreated copper foil used in Example 1, the same roughening and surface treatment as in Example 1 were performed so that the roughness of the obtained surface treatment side was about 4.0 μm in terms of Rz value, and the same as in Example 1 was performed. Evaluation assay. The results are shown in Table 1.
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