375results about "Reconditioning/cleaning record carriers" patented technology

The brushhead attachment system includes a hub member which is secured to a drive shaft of a personal care appliance for oscillating action. The hub member includes a number of spaced locking elements in the form of protrusions around the periphery thereof. An annular outer brushhead portion with a first group of bristles includes a plurality of spaced grooves in the outer surface thereof which mate with extending pins in the body of the appliance for insertion and removal of the outer brushhead portion. An inner brushhead portion is configured to fit within the annular opening of the outer brushhead portion and includes a plurality of depending legs which mate with the protrusions on the drive member for resulting oscillating action of the inner brushhead portion when the drive member oscillates, at least some of the legs having latch elements which fit onto an interior lip of the outer brushhead portion in such a manner that the inner and outer brushhead portions may be installed and removed as a unit, while permitting the inner brushhead portion to be freely rotatable relative to the outer brushhead portion.

A motorized cleaning implement is provided for cleaning surfaces with a cleaning substrate. The motorized cleaning implement includes a bumper pad that is connected to a motor capable of providing a reciprocating motion to the bumper pad. A cleaning substrate which includes a pocket is attached to the bumper pad.

An enclosure 23A that defines a drying chamber 23 is configured of a pair of enclosing elements 23c and 23d and a base element 23b. When wafers enter or leave the drying chamber 23, the enclosing elements 23c and 23d are lifted upward by vertical air cylinders 42 to separate them from the base element 23b. The enclosing elements 23c and 23d are then moved in directions that mutually separate them. To dry wafers within the drying chamber 23, the enclosing elements and the base element 23b are mutually engaged to form a hermetic seal, in the opposite sequence.The present invention reduces the dimensions of the drying chamber without impeding the work of moving wafers into and out of the drying chamber. This makes it possible to reduce the internal volume of the drying chamber, achieving a reduction is the consumption of drying gas, an improvement in the drying efficiency, and a reduction in overall size of the apparatus.

A cleaning implement is provided for cleaning surfaces with a cleaning substrate. The cleaning implement includes a handle connected via a universal joint to a mop head. The mop head includes a bumper pad, which is made of a deformable and nonabsorbent material. The bumper pad can be deformed in the Z direction and within the X-Y plane. The cleaning implement can also include a motor for causing a portion of the mop head to move relative to the handle.

An optical connector cleaning tool includes a holder, cleaner, and cap. The holder includes, a cylindrical slider, a cylindrical body which is rotatable and movable in the axial direction with respect to the slider, and a slider return spring which biases the body forward to return the slider to the initial position. The slider has a pair of elastic pieces having guide projections. In the outer circumferential surface of the body, spiral grooves with which the guide projections engage are formed within the angular range of 360°. When the slider moves forward, the body rotates by the cam action of the guide projections and spiral grooves. The cleaner includes, a cleaning thread accommodated in a rotary pod, a supply reel, a take-up reel, and a cleaning pin, and is connected to the body.

An immersion processing system is provided for cleaning wafers with an increased efficiency of chemical use. Such a system advantageously uses less cleaning enhancement substance that may be provided as gas, vapor or liquid directly to a meniscus or wafer / liquid / gas bath interface so as to effectively modify surface tensions at the meniscus with minimized chemical usage. Such a delivery system design may be applied for single wafer processing or for processing multiple wafers together within a single liquid bath vessel. For single wafer processing, in particular, cleaning enhancement substance can be delivered along one or both major sides of the wafer, preferably at the meniscus that is formed as the wafer and liquid are relatively moved, while a processing vessel usable for such single wafer processing may itself be designed with a minimized size to accommodate a single wafer. By reducing the vessel volume, chemical usage for any processing chemicals that are to be provided within a liquid bath may also be advantageously reduced.

A head slider is composed of a substrate having a transducer on its outflow end, a rail plane formed on a surface near both sides of the substrate facing a magnetic disk. The head slider further includes a plurality of projection elements formed on the rail plane. When the slider is floating over the magnetic disk, the distance between the projection elements and the magnetic disk is greater than the distance between the outflow end of the slider and the magnetic disk.

There is provided a circular guard so as to surround the vicinity of a tip portion of a probe mounted on an information recording / reading head, in order to prevent dusts from touching and colliding with the probe.