375results about "Reconditioning/cleaning record carriers" patented technology

Multi-directional wiping elements are disclosed. The wiping elements comprise intersecting squeegee segments that provide top wiping squeegee edges and side wiping squeegee edges. Devices utilizing the multi-directional wiping elements of the present invention can include bristles that are configured to simultaneously wipe a working surface with the wiping elements. In accordance with the embodiments of the invention, the multi-directional wiping elements are utilized in a toothbrush cleaning head that is configured to be operated manually or, alternatively, is motorized and is configured to rotate, oscillate, vibrate and / or move according to a combination thereof.

Embodiments of an automated camera cleaning system are provided. In one embodiment, the automated camera cleaning system includes an optical path, an optically-transmissive lens shield through which the optical path extends, a housing in which the optically-transmissive lens shield is at least partially disposed, and a motor coupled to the lens shield. When energized, the motor moves the optically-transmissive lens shield relative to the housing to vary the region of the optically-transmissive lens shield positioned in the optical path.

The brushhead attachment system includes a hub member which is secured to a drive shaft of a personal care appliance for oscillating action. The hub member includes a number of spaced locking elements in the form of protrusions around the periphery thereof. An annular outer brushhead portion with a first group of bristles includes a plurality of spaced grooves in the outer surface thereof which mate with extending pins in the body of the appliance for insertion and removal of the outer brushhead portion. An inner brushhead portion is configured to fit within the annular opening of the outer brushhead portion and includes a plurality of depending legs which mate with the protrusions on the drive member for resulting oscillating action of the inner brushhead portion when the drive member oscillates, at least some of the legs having latch elements which fit onto an interior lip of the outer brushhead portion in such a manner that the inner and outer brushhead portions may be installed and removed as a unit, while permitting the inner brushhead portion to be freely rotatable relative to the outer brushhead portion.

A magnetic tape which comprises a nonmagnetic support, a magnetic layer which is formed on one surface of the nonmagnetic support, and a backcoat layer which comprises a binder and nonmagnetic powder containing carbon black as a component and which is formed on the other surface of the nonmagnetic support, having pits for optical servo formed thereon, characterized in that the average of the reflectance on the flat portion of the backcoat layer is 8.5% or higher, and that the maximum rate of fluctuation of the reflectance on the flat portion, depending on a position of the magnetic tape:[Maximum of absolute value of (Reflectance−Average reflectance)]×100 / (Average reflectance)is 10% or lower. This magnetic tape is high in the initial S / N of the servo signal, and also high in the S / N of the servo signal found after the magnetic tape is run twice.

A device with two or more regions configured to clean or treat a working surface is disclosed. Preferably, the device is an oral-care device with a power cleaning head. The power cleaning head comprises two or more regions, wherein at least one of the regions is configured to move and wherein at least one of the regions comprises a squeegee element. Preferably, the regions are configured to independently rotate, oscillate, vibrate or otherwise move while cleaning teeth and gums and can each include bristles, nodules, squeegee elements, or any combination thereof.

A system includes a UV light source and an optical medium coupled to receive UV light from the UV light source. The optical medium is configured to emit UV light proximate to a surface from which biofouling is to be removed once the biofouling has adhered to the protected surface. A method corresponds to the system.

An optical connector clearing tool (1) includes a holder (2), cleaner (5), and cap (6). The holder (2) includes, e.g., a cylindrical slider (10), a cylindrical body (12) installed to be rotatable and movable in the axial direction with respect to the slider (10), and a slider return spring (13) which biases the body (12) forward to return the slider (10) to the initial position. The slider (10) has a pair of elastic pieces (16) having guide projections (17). In the outer circumferential surface of the body (12), spiral grooves (25, 26) with which the guide projections (17) engage are formed within the angular range of 360°. When the slider (10) moves forward, the body (12) rotates by the cam action of the guide projections (17) and spiral grooves (25, 26). The cleaner (5) includes, e.g., a cleaning thread (41) accommodated in a rotary pod (40), a supply reel (42), a take-up reel (43), and a cleaning pin (44), and is connected to the body (12). The rotary pod (40) and cleaning pin (44) rotate together with the body (12), and the cleaning thread (41) supplied to the distal end face of the cleaning pin (44) cleans the connection surface of an optical connector. The cleaning thread (41) is supplied from the supply reel (42) and taken up to the take-up reel (43) by being given tension by the rotation of the cleaner (5).

A motorized cleaning implement is provided for cleaning surfaces with a cleaning substrate. The motorized cleaning implement includes a bumper pad that is connected to a motor capable of providing a reciprocating motion to the bumper pad. A cleaning substrate which includes a pocket is attached to the bumper pad.

An enclosure 23A that defines a drying chamber 23 is configured of a pair of enclosing elements 23c and 23d and a base element 23b. When wafers enter or leave the drying chamber 23, the enclosing elements 23c and 23d are lifted upward by vertical air cylinders 42 to separate them from the base element 23b. The enclosing elements 23c and 23d are then moved in directions that mutually separate them. To dry wafers within the drying chamber 23, the enclosing elements and the base element 23b are mutually engaged to form a hermetic seal, in the opposite sequence.The present invention reduces the dimensions of the drying chamber without impeding the work of moving wafers into and out of the drying chamber. This makes it possible to reduce the internal volume of the drying chamber, achieving a reduction is the consumption of drying gas, an improvement in the drying efficiency, and a reduction in overall size of the apparatus.

A cleaning implement is provided for cleaning surfaces with a cleaning substrate. The cleaning implement includes a handle connected via a universal joint to a mop head. The mop head includes a bumper pad, which is made of a deformable and nonabsorbent material. The bumper pad can be deformed in the Z direction and within the X-Y plane. The cleaning implement can also include a motor for causing a portion of the mop head to move relative to the handle.

A compact, hand held carpet and upholstery extractor nozzle is provided having an air turbine and a compact gear reduction operatively connected to and driven by said turbine. At least a pair of scrub modules are interchangeably attachable to said gear reduction. A first scrub modules includes at least a pair of vertical axis scrub brushes for cleaning upholstery, carpeting and the like. When said first scrub module is attached to said gear reduction, the scrub brushes are operatively connected to and driven by said gear reduction. A second scrub module includes a single vertical axis scrub pad that is driven by said gear reduction for scouring hard surfaces, such as tiles, tubs, counter tops, etc.

After a rinse process on a wafer W is performed by feeding pure water to the surface of the wafer W at a predetermined flow rate while rotating the wafer W in an approximately horizontal state, a feed amount of the pure water to the wafer W is reduced, and a pure-water feed point is moved outward from the center of the wafer W. In this manner, the wafer W is subjected to a spin dry process while forming a liquid film in a substantially outer region of the pure-water feed point.

A lamp house is located face to face with a substrate which is transferred by a conveyer means. A dielectric barrier discharge lamp is provided in the lamp house to irradiate the substrate with ultraviolet light, while a moistened inert gas, consisting of an inert gas and water vapor, is supplied to a space between the substrate and the dielectric barrier discharge lamp from a moistened inert gas generating means. Under irradiation of ultraviolet light from the dielectric barrier discharge lamp, water vapor in the moistened inert gas is split into a reducing active member [H.] and an oxidative active member [.OH].< / PTEXT>

A substrate processing apparatus removes foreign substances from a substrate at high removal efficiency. The substrate processing apparatus includes: a scrubber to perform surface processing of the substrate by bringing a scrubbing member into sliding contact with a first surface of the substrate, a hydrostatic support mechanism for supporting a second surface of the substrate via fluid pressure without contacting the substrate, the second surface being an opposite surface of the first surface, a cleaner to clean the processed substrate, and a dryer to dry the cleaned substrate. The scrubber brings the scrubbing member into sliding contact with the first surface while rotating the scrubbing member about a central axis of the scrubber.

An oral-care device with a power cleaning head configured to dispense an oral-care cleaning solution is disclosed. The power cleaning head comprises squeegees and bristles and one or more apertures for dispensing the oral-care solution. Preferably, the squeegee and bristle are configured to rotate, oscillate, vibrate or otherwise move while dispensing the oral-care solution through the one or more apertures.

The invention provides a cleaning method and a cleaning apparatus in which the quantity of cleaning solvent used may be reduced, and high cleaning property is achieved. The cleaning method of the invention includes a first step of transporting a plate-shaped object to be processed on a support stand by a transporting unit and making hydrophiling preparation on at least one surface thereof, a second step of forming a liquid film on a surface of the object to be processed, on which hydrophiling preparation has made, and a third step of irradiating ultrasonic energy from an ultrasonically oscillating surface provided in the vicinity of the liquid film formed on the surface of the object to be processed so as to be capable of coming into contact therewith onto the object to be processed for cleaning.

A recovered disc of a structure in which plural disc substrates are bonded together with an adhesive, is to be recycled. To this end, there is provided a recycling method for a recovered disc wherein a recovered disc, containing a material of at least one coating film, out of a reflective film, a recording film, a protective film and an ink film, deposited on a disc substrate in addition to an adhesive used for bonding a plurality of the disc substrates together, is used as a starting material for preparing a flame retardant resin composition or resin molded product.

A motorized cleaning / polishing device includes a housing and a carrier with a detachable cleaning / polishing attachment. The housing contains a rechargeable battery, motor and flex mount having flexible pillars to which the carrier is mounted. The carrier is also coupled to the motor drive shaft via an eccentric element and bearing. The carrier may have a foam layer with hook fasteners adhered to its underside for removably attaching any one of various attachments to the carrier. Cleanser or polish can be impregnated in the attachment wet or dry, or it can be contained in a perforated or water dissolvable packet sandwiched between the carrier and the attachment. A removable scrub brush can also be attached to the carrier so that its bristle head orbits in front of the device. The device is particularly suited to orbit in the 2,500 to 10,000 OPM range.

A support tool for holding disposable pads and method of exfoliating or cleansing facial skin. The support tool includes a handle for supporting the pads during use, and a pad gripper system. A user of the cleansing system utilizes the pad gripper to either attach a disposable pad to the pad housing or to release a previously attached disposable pad. A method of exfoliating or cleansing facial skin includes attaching a disposable pad to a pad housing attached to a handle of a cleansing system by utilizing a grabbing / releasing means, moving the attached disposable pad over the facial skin with moderate pressure, and releasing the attached disposable pad from the pad housing by utilizing a grabbing / releasing means. A cleansing system package includes a cleansing device and a plurality of disposable pads.

A cleaner for an optical fiber connector which is made up of an elongated inner guide member having a base and an end tip, around which a cleaning member extends along the extension axis thereof, from the base to the end tip and returning again to the base; a sliding member supported so as to be slidable along the inner guide member and having a pair of guide parts that guide the cleaning member, which can slide between a projected position protruding beyond the end tip of the inner guide member and a retracted position retreating beyond the end tip, such that when the sliding member is in the projected position, the cleaning member is positioned extending around the sliding member instead of around the end tip of the inner guide member; and a tubular shaped external guide member that supports the sliding member and encloses the inner guide member and the cleaning member.

An immersion processing system is provided for cleaning wafers with an increased efficiency of chemical use. Such a system advantageously uses less cleaning enhancement substance that may be provided as gas, vapor or liquid directly to a meniscus or wafer / liquid / gas bath interface so as to effectively modify surface tensions at the meniscus with minimized chemical usage. Such a delivery system design may be applied for single wafer processing or for processing multiple wafers together within a single liquid bath vessel. For single wafer processing, in particular, cleaning enhancement substance can be delivered along one or both major sides of the wafer, preferably at the meniscus that is formed as the wafer and liquid are relatively moved, while a processing vessel usable for such single wafer processing may itself be designed with a minimized size to accommodate a single wafer. By reducing the vessel volume, chemical usage for any processing chemicals that are to be provided within a liquid bath may also be advantageously reduced.

A head slider is composed of a substrate having a transducer on its outflow end, a rail plane formed on a surface near both sides of the substrate facing a magnetic disk. The head slider further includes a plurality of projection elements formed on the rail plane. When the slider is floating over the magnetic disk, the distance between the projection elements and the magnetic disk is greater than the distance between the outflow end of the slider and the magnetic disk.

A cleaning implement is provided for cleaning surfaces with a cleaning substrate. The cleaning implement includes a handle connected via a universal joint to a mop head. The mop head includes a bumper pad, which is made of a deformable and nonabsorbent material. The bumper pad can be deformed in the Z direction and within the X-Y plane. The cleaning implement can also include a motor for causing a portion of the mop head to move relative to the handle.

An immersion processing system is provided for cleaning wafers with an increased efficiency of chemical use. Such a system advantageously uses less cleaning enhancement substance that may be provided as gas, vapor or liquid directly to a meniscus or wafer / liquid / gas bath interface so as to effectively modify surface tensions at the meniscus with minimized chemical usage. Such a delivery system design may be applied for single wafer processing or for processing multiple wafers together within a single liquid bath vessel. For single wafer processing, in particular, cleaning enhancement substance can be delivered along one or both major sides of the wafer, preferably at the meniscus that is formed as the wafer and liquid are relatively moved, while a processing vessel usable for such single wafer processing may itself be designed with a minimized size to accommodate a single wafer. By reducing the vessel volume, chemical usage for any processing chemicals that are to be provided within a liquid bath may also be advantageously reduced.

An article and process for cleaning relatively inaccessible and recessed surfaces, including a shaft having a first end opposite a second end with a cleaning head assembly, including a movable strip of buffing material, at the first end of the shaft. The article has an actuator at the second end of the shaft; and a connector coupling the cleaning head assembly to the actuator to move the movable strip during positional change of the actuator. Repeated positional change of the actuator produces reciprocatory movement in the movable strip of buffing material to produce a rubbing, cleaning action of the material against a recessed surface.

Embodiments of the invention include a CMP brush that has a combination of central nodules at an inner region of the brush and one or more edge nodules at an end region of the brush where the central nodules and edge nodules are in a staggered or matched arrangement with each other and an upper surface of each edge nodule on the brush has the same or a greater contact area than an upper surface of a central nodule. The area of contact of the upper surface of each edge nodule with the substrate edge region is the same or greater than the area of contact of the upper surface of a central nodule with the substrate center region.

An optical fiber connector cleaner (1) comprises a housing (10), a winding means (32) and a delivery means (34) for a cleaning tape (T) which are disposed in the housing, a cleaning means (20) having a bar-like cleaning section (21) projecting outwardly of the housing, on the front-end of the cleaning section the cleaning tape delivered from the delivery means being movably mounted under tension in an exposed state, the front-end of the cleaning section being brought into contact with the end surface of an optical fiber connector to thereby clean the end surface, a cleaning section rotating means (23) coaxially connected to the cleaning section in the housing and rotatably supported with respect to the housing; and a transmission means (40) which rotates the winding means and the cleaning section rotating means substantially simultaneously in a predetermined direction through a predetermined angle and then reverses the cleaning section rotating means to its original position.

Cleaning devices which use cleaning sheets affixed in traps are disclosed. The traps comprise first and second jaws, each comprising base and forward portions, each forward position having a forward surface. The forward portion of the second jaw is flexible in at least a first direction, such as towards a surface over which the device is configured to move. When the second jaw is relaxed, the forward portion of the second jaw is substantially coplanar with the forward portion of the first jaw and the forward surfaces are proximate or touching. When the second jaw is flexed in the first direction (e.g., by the application of a force from a user), the forward surface of the forward portion of the second jaw moves in the first direction, away from the forward surface of the first jaw. This opens a gap through which a portion of a sheet may be inserted.