Disclosed herein is a
coating and developing apparatus 1 whose decreases in substrate-conveying accuracy can be suppressed. A
processing block S2 of the
coating and developing apparatus 1 includes multiple
resist-film forming blocks G2, G3, and a developing block G1. A conveyance element 12 for substrate loading into the
processing block S2 is provided to convey substrates W from a carrier C to the
resist-film forming blocks G2, G3. Also, a conveyance element I for substrate loading into an
exposure apparatus S4 is provided in an interface block S3 to load the substrates W into the
exposure apparatus S4 and after unloading the substrates W from the
exposure apparatus S4, convey the substrates W to the developing block G1. The
processing block loading conveyance element 12 conveys the substrates W, one at a time, from the carrier C to each
resist-film forming block G2, G3, sequentially and periodically, and the exposure apparatus loading conveyance element I loads the substrates W from each resist-film forming block G2, G3 into the exposure apparatus S4 in the sequence that each has been conveyed to the resist-film forming block G2, G3 by the processing block loading conveyance element 12.