476 results about "Optical distortion" patented technology

Optical probes having a diameter less than substantially 500 μm for use in scanning light from a long, highly flexible fiber to a sample. In one embodiment the probe includes a viscous damping fluid suitable to prevent non-uniform rotational distortion (NURD).

The invention provides a contact lens which requires a predetermined orientation on an eye. The contact lens comprises an anterior surface and an opposite posterior surface. The anterior surface includes a vertical meridian, a horizontal meridian, a central optical zone, a transitional non-optical zone surrounding the central optical zone, a peripheral zone surrounding the transitional non-optical zone, and an edge zone circumscribing and tangent to the peripheral zone. The presence of the transitional non-optical zone provides a continuous transition from the central optical zone to the peripheral zone and enables separate and independent designs of the central optical zone and the peripheral zone. Orientation features are incorporated only in the peripheral zone, does not provide an prism optical distortion, and can maintain a predetermined orientation of the lens on an eye.

An flow meter includes a coupler, a support member, an image sensor, and one or more processors. The coupler is adapted to couple to a drip chamber. The support member is operatively coupled to the coupler. The image sensor has a field of view and is operatively coupled to the support member. The image sensor is positioned to view the drip chamber within its field of view. The one or more processors are operatively coupled to the image sensor to receive data thereform. The one or more processors (1) receive image data from the image sensor, and (2) determine an existence of a free flow condition by identifying an optical distortion of an area behind the free flow condition within the drip chamber using the received image data.

An flow meter includes a coupler, a support member, an image sensor, and one or more processors. The coupler is adapted to couple to a drip chamber. The support member is operatively coupled to the coupler. The image sensor has a field of view and is operatively coupled to the support member. The image sensor is positioned to view the drip chamber within its field of view. The one or more processors are operatively coupled to the image sensor to receive data therefrom. The one or more processors (1) receive image data from the image sensor, and (2) determine an existence of a free flow condition by identifying an optical distortion of an area behind the free flow condition within the drip chamber using the received image data.

An flow meter includes a coupler, a support member, an image sensor, and one or more processors. The coupler is adapted to couple to a drip chamber. The support member is operatively coupled to the coupler. The image sensor has a field of view and is operatively coupled to the support member. The image sensor is positioned to view the drip chamber within its field of view. The one or more processors are operatively coupled to the image sensor to receive data thereform. The one or more processors (1) receive image data from the image sensor, and (2) determine an existence of a free flow condition by identifying an optical distortion of an area behind the free flow condition within the drip chamber using the received image data.

A system and method of monitoring and predicting tool overlay settings comprise generating current lot information, generating historical data, categorizing (binning) the historical data into discrete exposure field size ranges, and predicting current lot tool overlay settings based on the current lot information and historical data. The method monitors the overlay errors during each lot pass through each lithographic process operation. Moreover, the method uses a feedback sorting criteria to monitor the tool overlay settings. Furthermore, the current lot information comprises lithographic field dimensions, wherein the lithographic field optics distortion data is derived from the current lithographic process tool. Additionally, the historical data comprises same-bin lithographic field size dimensions of previous lots, which statistically means the data is derived from the same (or similar) bin of like lots, on the current lithographic process tool.

The present invention provides a real-time three-dimensional pattern recognition imaging system having a variable focal length, a wide depth of field, a high depth resolution, a fast acquisition time, a variable magnification, a variable optical axis for tracking, and capability of compensating various optical distortions and aberrations, which enables pattern recognition systems to be more accurate as well as more robust to environmental variation. The imaging system for pattern recognition comprises one or more camera system, each of which has at least one micromirror array lens(MMAL), a two-dimensional image senor, and an image processing unit. A MMAL has unique features including a variable focal length, a variable optical axis, and a variable magnification.

A first optical module scans a portion of an eye with a line of light, descans reflected light from the scanned portion of the eye and confocally provides output light in a line focus configuration. A detection device detects the output light and images the portion of the eye. A second optical module detects an optical distortion and corrects the optical distortion in the line of light scanned on the portion of the eye.

An image sensor for detecting a wide spectrum includes a plurality of infrared ray receiving layers which individually receive infrared rays having different wavelengths for each pixel, the plurality of infrared ray receiving layers stacked to each other. The image sensor, which is an integrated image sensor where at least two micro bolometers are stacked, acquires spectrum information about visible rays and near-infrared rays as well as two or more infrared rays applied on an object, without mechanical / thermal / optical distortion, and provides the spectrum information to a silicon-based semiconductor such as a photodiode, thereby improving photoelectric conversion efficiency.