Highly conductive and corrosion-resistant graphitic carbon protective multilayer composite coating and its preparation method and application
A multi-layer composite and high-conductivity technology, which is applied in coatings, metal material coating processes, fuel cell components, etc., can solve the problems of plate performance degradation and contact resistance increase, and achieve low contact resistance, structural Densification, the effect of improving the bonding strength of the membrane base
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[0035] In some more specific embodiments, the preparation method includes: using high-power pulsed magnetron sputtering technology, placing the substrate in a reaction chamber, using a chromium-iridium composite target as the target material, and using an inert gas as the The working gas is deposited on the surface of the substrate to form a chromium-iridium transition layer, wherein the high-power pulse magnetron sputtering technology adopts a pulse frequency of 400-800 Hz, a pulse width of 50-200 μs, and a pulse voltage of 800-1000 V, The power is 2.0~3.5KW, the pressure of the reaction chamber is 1.4~2.1mTorr, the substrate bias is -50V~-150V, the amount of inert gas is 30~70sccm, the deposition temperature is 40~80°C, and the deposition time is 5~15min.
[0036]Further, the inert gas includes argon, but is not limited thereto.
[0037] In some more specific embodiments, the preparation method includes: using DC magnetron sputtering technology, using a graphite target as a...
Embodiment 1
[0050] In this embodiment, the preparation method of the highly conductive corrosion-resistant protective coating on the metal bipolar plate is as follows:
[0051] S1. The substrate is made of 316L stainless steel, and the stainless steel bipolar plate is ultrasonically cleaned, dried and placed in a vacuum chamber, fixed on the workpiece bracket, and vacuumed to 2.0×10 -5 Below Torr, turn on the ion source under the conditions of argon gas flow rate of 100 sccm and bias voltage of -450V, adjust the output voltage to 1200V, and use argon plasma to etch the surface of the stainless steel bipolar plate for 60 minutes;
[0052] S2. Introduce Ar gas into the cavity (the input amount of Ar gas is 30sccm), adopt high-power pulse magnetron sputtering technology, maintain the cavity pressure at 1.4mTorr, open the chromium-iridium composite sputtering target (iridium content 2%wt) connected high-power pulse power supply, set the power supply frequency to 400Hz, pulse width to 50µs, pu...
Embodiment 2
[0056] In this embodiment, the preparation method of the highly conductive corrosion-resistant protective coating on the metal bipolar plate is as follows:
[0057] S1. The substrate is made of 316L stainless steel, and the stainless steel bipolar plate is ultrasonically cleaned, dried and placed in a vacuum chamber, fixed on the workpiece bracket, and vacuumed to 2.0×10 -5 Below Torr, turn on the ion source under the conditions of argon gas flow rate of 40 sccm and bias voltage of -150V, adjust the output voltage to 1200V, and use argon plasma to etch the surface of the stainless steel bipolar plate for 30 minutes;
[0058] S2. Introduce Ar gas into the cavity (the input amount of Ar gas is 60sccm), adopt high-power pulse magnetron sputtering technology, maintain the cavity pressure at 2.0mTorr, open the chromium-iridium composite sputtering target (iridium content 10%wt) connected high-power pulse power supply, set the power frequency to 800Hz, pulse width to 100µs, pulse vo...
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