Method for improving high toughness of titanium aluminum nitrogen coating on surface of hard alloy
A cemented carbide, titanium aluminum nitrogen technology, applied in metal material coating process, coating, solid diffusion coating and other directions, can solve the problems of large difference in thermodynamic properties, low bonding strength of coatings, easy to fall off, etc. Improve the bonding force and fracture toughness, good toughness, good toughness effect
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Embodiment 1
[0041] This embodiment provides a method for improving the strength and toughness of the titanium-aluminum-nitrogen coating on the surface of the cemented carbide by using the device as described above, comprising the following steps:
[0042] (1) Pretreatment of cemented carbide samples: mechanically grind and polish the YG8 cemented carbide sheet with a length and width of 16mm and a thickness of 4.5mm, and then immerse it in acetone, alcohol and distilled water for 10 minutes respectively for ultrasonic cleaning , dry with cold air for later use;
[0043] (2) Put the pretreated cemented carbide sample into such as figure 1 On the sample stage 4 of the double-glow plasma metallization equipment shown, the source 2 is fixed with a self-made tantalum wire target with a purity of 99.9%, a diameter of 2 mm and a length of 20 mm, and the source 2 is facing the sample stage 4. The distance between the sample stage 4 is 12mm, and then the auxiliary cathode cover 3 is placed, and a...
Embodiment 2
[0050] This embodiment provides a method for improving the strength and toughness of the titanium-aluminum-nitrogen coating on the surface of the cemented carbide by using the device described in Embodiment 1, comprising the following steps:
[0051] (1) Pretreatment of cemented carbide samples: mechanically grind and polish YG8 cemented carbide sheets with a length and width of 16mm and a thickness of 4.5mm, and then immerse them in acetone, alcohol and distilled water for 10 minutes respectively for ultrasonic cleaning , dry with cold air for later use;
[0052] (2) Put the pretreated cemented carbide sample into the figure 1 On the sample stage 4 of the double-glow plasma metallization equipment shown, the source 2 is fixed with a self-made tantalum wire target with a purity of 99.9%, a diameter of 2 mm and a length of 20 mm, and the source 2 is facing the sample stage 4. The distance between the sample stage 4 is 12mm, and then the auxiliary cathode cover 3 is placed, and...
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