Method for constructing implant active surface with high-content BMP/RGD coating
A construction method and active surface technology, which is applied in the construction field of implant active surfaces, can solve the problems of difficulty in fully exerting biological activity, poor long-term stability effect, and low BMP adsorption amount, etc., to improve roughness and surface energy, enhance Active, adhesion-promoting effect
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Embodiment 1
[0028] The implant active surface with high content BMP / RGD coating was prepared as follows:
[0029] (1) The surface of the titanium metal implant was polished step by step with 200, 300, 600 and 2000 mesh sandpaper, cleaned, and dried at 60°C;
[0030] (2) Use 75μm TiO 2 Particles, sandblasting the surface of the implant through a nozzle, the sandblasting conditions are: the compressed air pressure is 0.3-0.4MPa, the distance between the nozzle and the implant surface is 5cm, and the spraying time is 2s;
[0031] (3) Place the sandblasted implant in a mixed acid etchant composed of hydrofluoric acid and hydrochloric acid for surface etching treatment. The etching treatment temperature is 60°C, and the etching treatment time is 10 minutes. The implant is taken out and ultrasonically Clean and dry naturally at room temperature; wherein the mixed etching agent is a mixture of 47% HF and 38% HCl in a volume ratio of 1:1;
[0032] (4) Incubate the dried implant at 60°C in a 5mo...
Embodiment 2
[0039]The implant active surface with high content BMP / RGD coating was prepared as follows:
[0040] (1) The surface of the titanium metal implant was polished step by step with 200, 300, 600 and 2000 mesh sandpaper, cleaned, and dried at 60°C;
[0041] (2) Use 75μm TiO 2 Particles, sandblasting the surface of the implant through a nozzle, the sandblasting conditions are: the compressed air pressure is 0.3-0.4MPa, the distance between the nozzle and the implant surface is 8cm, and the spraying time is 10s;
[0042] (3) Place the sandblasted implant in a mixed acid etchant composed of hydrofluoric acid and hydrochloric acid for surface etching treatment. The etching treatment temperature is 60°C, and the etching treatment time is 10 minutes. The implant is taken out and ultrasonically Clean and dry naturally at room temperature; wherein the mixed etching agent is a mixture of 47% HF and 38% HCl in a volume ratio of 1:1;
[0043] (4) Incubate the implant after surface etching ...
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