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Ultrathin metal membrane terahertz absorbed layer and preparation method thereof

An ultra-thin metal, terahertz technology, which is used in the field of terahertz detection and imaging, and can solve problems such as the preparation of absorption layers that cannot be used in terahertz detectors

Active Publication Date: 2013-04-10
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This method is mainly used in the preparation of the absorbing layer of the infrared focal plane detector. Since the thickness of the metal film used to absorb terahertz radiation is very small, it is difficult to use chemical methods to corrode and continue to corrode to form a porous structure, so it cannot be applied to the terahertz detector. Preparation of the absorbent layer

Method used

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  • Ultrathin metal membrane terahertz absorbed layer and preparation method thereof
  • Ultrathin metal membrane terahertz absorbed layer and preparation method thereof
  • Ultrathin metal membrane terahertz absorbed layer and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0055] An ultra-thin metal film terahertz absorption layer, which is prepared on the top layer of the detection unit of the terahertz microarray detector, such as figure 2 shown.

[0056] The detection unit of the terahertz microarray detector such as figure 2 -a shown. The array unit is prepared on the silicon wafer with the underlying readout circuit 3, wherein the readout circuit has an interface 4 with the subsequent MEMS device, and then grows a sacrificial layer 5, a supporting layer 6, metal electrodes and leads 7, and a sensitive film 8 etc. and graph them separately. The sacrificial layer material can be silicon oxide film or photosensitive polyimide (PSPI) material; the support layer material is composed of silicon nitride, silicon oxide or multi-layer composite film; the metal electrode is aluminum, titanium, nickel-chromium alloy, etc. ; Sensitive films are vanadium oxide films, amorphous silicon films, etc.

[0057] The aluminum metal thin film 9 was prepare...

Embodiment 2

[0062] An ultra-thin metal film terahertz absorbing layer, which is prepared on the top layer of the pyroelectric terahertz detection unit, such as image 3 shown.

[0063] Pyroelectric terahertz detection unit such as image 3 -a shown. The preparation process of the detection unit is: remove a part of the silicon substrate 10 by chemical etching, and then prepare the silicon dioxide insulating layer 11, the lower electrode 12, the lithium tantalate pyroelectric film 13, the upper electrode 14 and the silicon nitride dielectric layer 15 .

[0064] Clean the top surface of the detection unit to remove surface contamination, and bake the substrate at 200°C to remove surface moisture and enhance the adhesion of the dielectric film.

[0065] The NiCr alloy thin film 16 was prepared by magnetron sputtering. Adjust the process parameters to control the film thickness to 100nm, such as image 3 -b shown.

[0066] The wet chemical etching method is used to etch and thin the NiC...

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Abstract

The invention discloses an ultrathin metal membrane terahertz absorbed layer and a preparation method thereof. Absorbed layer equipment is arranged on the top layer of a terahertz detector sensing unit. An ultrathin metal membrane adjusts a craft parameter and distribution of etching agent concentration by etching and thinning metal ultrathin equipment with a big thickness in the process of etching and thinning, a microcell etching rate difference is caused, and a rough, multi-hole and melanism ultrathin metal membrane is obtained. The etching method has two types, one method enables a metal thin membrane to be etched to the ultrathin metal membrane by utilizing of a reaction ion etching method and the etching late corrosion phenomenon of a dry method, and the method has the advantages that the reaction process and the thickness of the ultrathin metal membrane are easily controlled and the like. The other method enables the metal thin membrane to be corroded to the ultrathin metal membrane by utilizing a wet process chemical corrosion method, and the other method has the advantages that the surface shape and the color of the ultrathin metal membrane are easily controlled, and the like. The surface structure of the rough, multi-hole and melanism metal thin membrane has the advantages of being high in surface body ratio and low in reflectivity, and effectively enhances absorption performance and rate of terahertz radiation.

Description

technical field [0001] The invention relates to the technical field of terahertz detection and imaging, in particular to an ultra-thin metal film terahertz absorbing layer and a preparation method thereof. Background technique [0002] Terahertz (Terahertz, THz) wave refers to electromagnetic radiation with a frequency between 0.1~10THz (wavelength 3mm~30??m), and its electromagnetic spectrum is between the microwave and infrared bands. Therefore, the terahertz system takes into account both electronics and optical systems The advantages. For a long time, due to the lack of effective THz radiation generation and detection methods, people's understanding of the nature of electromagnetic radiation in this band is so limited that this band is called the THz gap in the electromagnetic spectrum. This band is also the last frequency window in the electromagnetic spectrum to be fully studied. In recent years, due to the development of free electron laser and ultrafast laser techn...

Claims

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Application Information

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IPC IPC(8): H01P1/20H01P11/00G02B5/00
Inventor 苟君王军黎威志蒋亚东吴志明
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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