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581results about "Geometric properties/aberration measurement" patented technology

Scanning interferometer for aspheric surfaces and wavefronts

Interferometric scanning method(s) and apparatus for measuring rotationally and non-rotationally symmetric test optics either having aspherical surfaces or that produce aspherical wavefronts. A spherical or partial spherical wavefront is generated from a known origin along an optical axis. The test optic is aligned with respect the optical axis and selectively moved along it relative to the known origin so that the spherical wavefront intersects the test optic at the apex of the aspherical surface and at radial positions where the spherical wavefront and the aspheric surface intersect at points of common tangency. An axial distance, ν, and optical path length, p, are interferometrically measured as the test optic is axially scanned by the spherical wavefront where ν is the distance by which the test optic is moved with respect to the origin and p is the optical path length difference between the apex of an aspherical surface associated with the test optic and the apex of the circles of curvature that intersect the aspherical surface at the common points of tangency. Coordinates of the aspherical surface are calculated wherever the circles of curvature have intersected the aspherical surface and in correspondence with the interferometrically measured distances, ν and p. Afterwards, the shape of the aspheric surface is calculated. Where the test optic comprises a refracting optic a known spherical reflecting surface is provided upstream of the refracting optic for movement along the optical axis and a known wavefront is made to transit the refracting optic, reflects from the known spherical surface, again transits the refracting optic traveling towards the known origin after which the interferogram is formed. In another aspect of the invention, a spherical reference surface is provided to form a Fizeau that is used to generate phase information for measuring spheres, mild aspheres, and multiple mild aspheres.
Owner:ZYGO CORPORATION

Blazed grating measurements of lithographic lens aberrations

Exposures of a photosensitive material through an array of blazed gratings illuminate a lens asymmetrically to detect effects of a plurality of azimuthal aberrations including coma, astigmatism, and three-leaf and four-leaf clover aberrations. A plurality of such exposures of the array of blazed gratings at slightly differing focus allows detection of focus shift due to any aberrations present in the lens. Upon development of the plurality of exposures, contrast of each area is measured, for example, by reflection or scattering from the relief in the developed photosensitive material and the aberrations thus detected can be simulated by effective summation of individual aberration effects.
Owner:GLOBALFOUNDRIES INC

Scanning interferometer for aspheric surfaces and wavefronts

Interferometric scanning method(s) and apparatus for measuring rotationally and non-rotationally symmetric test optics either having aspherical surfaces or that produce aspherical wavefronts. A spherical or partial spherical wavefront is generated from a known location along a scanning axis though the use of a decollimator carrying a spherical reference surface. The test optic is aligned with respect to the scanning axis and selectively moved along it relative to the known origin so that the spherical wavefront intersects the test optic at the apex of the aspherical surface and at radial zones where the spherical wavefront and the aspheric surface possess common tangents. The test surface is imaged onto a space resolving detector to form interferograms containing phase information about the differences in optical path length between the spherical reference surface and the test surface while the axial distance, v, by which said test optic moves relative to said spherical reference surface is interferometrically measured. Based on an analysis of the phase information contained in the interferograms and the axial distance, v, the deviation in the shape of the aspheric surface from its design in a direction normal to the aspheric surface is determined. In scanning, two cameras having different magnification are preferably used simultaneously with the one of higher magnification observing near the part axis where high fringe densities occur while that of lower magnification observes the full part surface. Special procedures are described for alternately improving accuracy near the axis.
Owner:ZYGO CORPORATION

Reconfigurable interferometer system

InactiveUS20050083537A1Facilitate simultaneous measurementEasy alignmentOptical measurementsUsing optical meansWavefrontLength wave
Interferometric apparatus and methodology for precisely measuring the shape of rotationally and non-rotationally symmetric optical surfaces comprising an illumination source with two wavelengths, a transmission flat with a reference surface, a basic optical system for producing a wavefront of predetermined shape, a compensation component having an aspheric wavefront shaping surface and an aspheric reference surface. The aspheric shaping surface modifies the predetermined wavefront so that it impinges on the aspheric reference surface with a shape substantially that same as that of aspheric reference surface. For a given aspheric reference surface, the radius or curvature and spacing of the aspheric shaping surface are optimized so that its aspheric departure is no larger than that of the aspheric reference surface. Precise alignment in six degrees of freedom is provided via feedback control.
Owner:ZYGO CORPORATION

Aspheric diffractive reference for interferometric lens metrology

A diffractive optical element is used to provide an aspherical wavefront to a lens under test in an interferometer or to provide an aspheric null surface. When providing an aspherical wavefront, the diffractive may be in the path of one or both beams to be interfered. Robust and adaptable aspheric testing may be realized.
Owner:DIGITALOPTICS CORPORATION

Optical sensing system for determining the position and/or shape of an associated object

The present invention relates to an optical sensing system (1) for determining the position and / or shape of an associated object (O), the system comprises an optical fibers (10) having one or more optical fiber cores (9) with one or more fiber Bragg gratings (FBG, 8) extending along the full length where the position and / or shape is be to determined of said object (O). A reflectometer (REFL, 12) measures strain at a number of sampling points along the optical fiber cores, and a processor (PROC, 14) determines the position and / or shape based on said measured strains from the plurality of optical fiber cores. The fiber Bragg grating(s) (FBG, 8) extends along the full length of said optical fiber cores (9), the fiber core having a spatially modulated reflection (r) along the said full length of the optical fiber core so that the corresponding reflection spectrum is detectable in said wavelength scan. Thus, the fiber Bragg grating(s) may be effectively continuous along the optical fiber leaving no gaps so that every position gives rise to a detectable reflection, and achieving that the reflection spectrum may encompass a wavelength span equaling the wavelength scan, or ‘sweep’, of an optical source in the reflectometer.
Owner:KONINKLIJKE PHILIPS ELECTRONICS NV

Method and apparatus for determining object characteristics

Embodiments of the invention provide a method of determining one or more characteristics of a target object, comprising determining a first phase map for at least a region of a target object based on radiation directed toward the target object, determining one or more further phase maps for a sub-region of the region of the target object, determining a number of phase wraps for the sub-region based on a plurality of phase maps for the sub-region, and determining a characteristic of the region of the target object based on the number of phase wraps for sub-region and the first phase map. Embodiments of the invention also relate to a method of determining one or more characteristics of a target object, comprising determining a phase map for at least a region of a target object based on one or more diffraction patterns, determining a wavefront at a plane of the object based upon the phase map, and determining a refractive property of the object based on the wavefront.
Owner:PHASE FOCUS

Optical sensing system for determining the position and/or shape of an associated object

The present invention relates to an optical sensing system (1) for determining the position and / or shape of an associated object (O), the system comprises an optical fibers (10) having one or more optical fiber cores (9) with one or more fiber Bragg gratings (FBG, 8) extending along the full length where the position and / or shape is be to determined of said object (O). A reflectometer (REFL, 12) measures strain at a number of sampling points along the optical fiber cores, and a processor (PROC, 14) determines the position and / or shape based on said measured strains from the plurality of optical fiber cores. The fiber Bragg grating(s) (FBG, 8) extends along the full length of said optical fiber cores (9), the fiber core having a spatially modulated reflection (r) along the said full length of the optical fiber core so that the corresponding reflection spectrum is detectable in said wavelength scan. Thus, the fiber Bragg grating(s) may be effectively continuous along the optical fiber leaving no gaps so that every position gives rise to a detectable reflection, and achieving that the reflection spectrum may encompass a wavelength span equaling the wavelength scan, or ‘sweep’, of an optical source in the reflectometer.
Owner:KONINK PHILIPS ELECTRONICS NV

Refractive index distribution measuring method and refractive index distribution measuring apparatus

The measuring method includes a step of causing reference light to enter an object placed in a first medium to measure a first transmitted wavefront, a step of causing the reference light to enter the object placed in a second medium to measure a second transmitted wavefront, a step of measuring first and second placement positions where the object is placed in the first and second media, and a calculating step of calculating an internal refractive index distribution of the object by using measurement results of the first and second transmitted wavefronts. The calculating step calculates the internal refractive index distribution from which a shape component of the object is removed by using the measurement results of the first and second transmitted wavefronts, and first and second reference transmitted wavefronts of a reference object to be placed at positions identical to the first and second placement positions.
Owner:CANON KK

Method for accurate high-resolution measurements of aspheric surfaces

A system comprising a plurality of methods for measuring surfaces or wavefronts from a test part with greatly improved accuracy, particularly the higher spatial frequencies on aspheres. These methods involve multiple measurements of a test part. One of the methods involves calibration and control of the focusing components of a metrology gauge in order to avoid loss of resolution and accuracy when the test part is repositioned with respect to the gauge. Other methods extend conventional averaging methods for suppressing the higher spatial-frequency structure in the gauge's inherent slope-dependent inhomogeneous bias. One of these methods involve averages that suppress the part's higher spatial-frequency structure so that the gauge's bias can be disambiguated; another method directly suppresses the gauge's bias within the measurements. All of the methods can be used in conjunction in a variety of configurations that are tailored to specific geometries and tasks.
Owner:QED TECH INT

Apparatus for and method of measurement of aspheric surfaces using hologram and concave surface

An aspheric surface measuring apparatus includes an interferometer which generates incident light; a test piece having an aspheric surface from which the incident light is reflected as test light; a first optical element disposed on an optical path of the incident light, having at least one surface with a hologram for diffracting the incident light toward the test piece; and a second optical element disposed after the first optical element, which transmits the incident light toward the aspheric surface and has a concave surface to reduce an incident angle of the test light entering the hologram after having been reflected from the aspheric surface. Alternatively, a single optical element with a hologram and a concave surface can be used instead of the separate first and second optical elements. An extremely aspheric lens can be precisely measured using the apparatus.
Owner:SAMSUNG ELECTRONICS CO LTD

Scanning interferometer for aspheric surfaces and wavefronts

Interferometric scanning method(s) and apparatus for measuring rotationally and non-rotationally symmetric test optics having spherical, mildly aspherical and multiple, mildly aspherical surfaces. At least a partial spherical wavefront is generated from a known origin along a scanning axis through the use of a spherical reference surface positioned along the scanning axis upstream of the known origin. A test optic is aligned with respect to the scanning axis and selectively moved along said scanning axis relative to the known origin so that the spherical wavefront intersects the test optic at the apex of the aspherical surface and at one or more radial positions where the spherical wavefront and the aspheric surface intersect at points of common tangency to generate interferograms containing phase information about the differences in optical path length between the center of the test optic and the one or more radial positions. The interferogram is imaged onto a detector to provide an electronic signal carrying the phase information. The axial distance, ν, by which said test optic is moved with respect to said origin is interferometrically measured and the optical path length differences, p, between the center of test optic and the one or more radial positions is calculated based on the phase differences contained in the electronic signal. The coordinates, z and h, of the aspherical surface are calculated wherever the circles of curvature have intersected the aspherical surface at common points of tangency and in correspondence with the interferometrically measured distance, ν and calculated optical path lengths, p. The shape of the aspheric surface is then determined based on the coordinate values and the optical path length differences.
Owner:ZYGO CORPORATION

Apparatus and method for evaluation of optical elements

An apparatus for measuring the optical performance characteristics and dimensions of an optical element comprising a low coherence interferometer and a Shack-Hartmann wavefront sensor comprising a light source, a plurality of lenslets, and a sensor array is disclosed. The low coherence interferometer is configured to direct a measurement beam along a central axis of the optical element, and to measure the thickness of the center of the optical element. The light source of the Shack-Hartmann wavefront sensor is configured to emit a waveform directed parallel to and surrounding the measurement beam of the interferometer, through the plurality of lenslets, and to the sensor array. A method for measuring the optical performance characteristics and dimensions of a lens using the apparatus is also disclosed.
Owner:LUMETRICS

Method and device of differential confocal and interference measurement for multiple parameters of an element

The present invention relates to the field of optical precision measurement technologies, and in particular, to a method and a device of differential confocal (confocal) and interference measurement for multiple parameters of an element. The core concept of the invention lies in that: the concurrent high-precision measurement of multiple parameters of an element may be realized by measuring the surface curvature radius of an element with spherical surface, the back focal length of a lens, the refractive index of a lens, the thickness of a lens and the axial spaces of an assembled lenses by using a differential confocal (confocal) measuring system and measuring the surface profile of the element by using a figure interference measuring system. In the invention, a differential confocal (confocal) detection system and a figure interference measuring system are combined for the first time, the method covers more measured parameters, and during the measurement of multiple parameters of an element, it is not essential to readjust the optical path or disassemble the test element, thus no damage will be caused on the test element, and the measurement speed will be fast.
Owner:BEIJING INSTITUTE OF TECHNOLOGYGY

Scanning interferometric methods and apparatus for measuring aspheric surfaces and wavefronts

Interferometric scanning method(s) and apparatus for measuring test optics having aspherical surfaces including those with large departures from spherical. A reference wavefront is generated from a known origin along a scanning axis. A test optic is aligned on the scanning axis and selectively moved along it relative to the known origin so that the reference wavefront intersects the test optic at the apex of the aspherical surface and at one or more radial positions where the reference wavefront and the aspheric surface intersect at points of common tangency (“zones”) to generate interferograms containing phase information about the differences in optical path length between the center of the test optic and the one or more radial positions. The interferograms are imaged onto a detector to provide an electronic signal carrying the phase information. The axial distance, ν, by which the test optic is moved with respect to the origin is interferometrically measured, and the detector pixel height corresponding to where the reference wavefront and test surface slopes match for each scan position is determined. The angles, α, of the actual normal to the surface of points Q at each “zone” are determined against the scan or z-axis. Using the angles, α, the coordinates z and h of the aspheric surface are determined at common points of tangency and at their vicinity with αmin≦α≦αmax, where αmin and αmax correspond to detector pixels heights where the fringe density in the interferogram is still low. The results can be reported as a departure from the design or in absolute terms.
Owner:ZYGO CORPORATION

Method for measuring and manufacturing an optical element and optical apparatus

A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.
Owner:CARL ZEISS SMT GMBH

Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure

Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
Owner:CARL ZEISS SMT GMBH

Lightwave interference measurement apparatus

A microinterferometer applies low coherent measurement light, which travels along an optical axis in a converging manner, to a front surface of a flange. A part of the measurement light is reflected inside an interferometric optical system, and becomes reference light. Apart of the measurement light passed through the interferometric optical system is reflected from the front surface of the flange, and is incident again upon the interferometric optical system. By combining the reflected light with the reference light, interference light is obtained. While a sample rotating stage rotates a sample lens through 360 degrees, a first imaging camera having one-dimensional image sensor captures 3600 images of the interference light, i.e., the image of the interference light is captured every time the sample lens is rotated by 0.1 degrees. Based on the images of interference fringes, the shape of the front surface of the flange is analyzed.
Owner:FUJIFILM CORP

Near-Null Compensator and Figure Metrology Apparatus for Measuring Aspheric Surfaces by Subaperture Stitching and Measuring Method Thereof

A variable near-null compensator for measuring aspheric surfaces by subaperture stitching includes a pair of counter-rotating CGH phase plates, each of the phase plates having a phase function including two terms Z5 and Z7 of Zernike polynomials. The phase plates are mounted on a pair of precision rotary center-through tables, wherein rotational axes of the pair of precision rotary center-through tables coincide with the optical axes of the phase plates. A figure metrology apparatus includes a wavefront interferometer, the test mirror mount, the near-null compensator and the mechanical adjustment components therefor. The optical axis of the near-null compensator coincides with the optical axis of the interferometer. A method for measuring aspheric surfaces by subaperture stitching includes the steps of mounting the test mirror, measuring the subapertures with the figure metrology apparatus, and finally processing the data by stitching.
Owner:NAT UNIV OF DEFENSE TECH

Method for calibrating an interferometer apparatus, for qualifying an optical surface, and for manufacturing a substrate having an optical surface

A method for qualifying and / or manufacturing an optical surface includes:arranging a first substrate having a first surface and a second surface opposite the first surface in a beam path of a first incident beam with the first surface facing towards the first incident beam, and taking an interferometric measurement of the second surface;arranging the first substrate in the beam path of the first incident beam with the second surface facing towards the first incident beam, and taking an interferometric measurement of the second surface;arranging a third surface of a second substrate in a beam path of a second incident beam, and taking an interferometric measurement of the third surface;arranging the third surface of the second substrate and the first substrate in the beam path of the second incident beam, and taking an interferometric measurement of the third surface.
Owner:CARL ZEISS SMT GMBH

Lens shape measurement device

A lens shape measurement device, includes: a rotation unit that rotates a lens supported by a stage; a laser displacement meter; a first moving unit that moves the laser displacement meter in a X-direction; a second moving unit that moves the lens in a Y-direction; and a drive controller that controls a drive of the rotation unit, the first moving unit, and the second moving unit in a mirror reflection state in which an incidence angle of the laser beams incident on a measurement target from the laser displacement meter, and a reflection angle of the laser beams reflected by the measurement target are equal to each other with a normal line of the lens passing through the measurement target set as a reference, for each of a plurality of measurement targets set on an edge of the lens in a rotating direction of the lens.
Owner:HOYA CORP
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