Perovskite solar cell with interface modification layers and preparation method of perovskite solar cell
A technology for interface modification layers and solar cells, which is applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of poor long-term stability of perovskite solar cells, improve photoelectric conversion efficiency, inhibit ion migration, and optimize crystal structure. Effect
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[0055] The present invention also discloses a method for preparing a perovskite solar cell with an interface modification layer as described above, comprising the following steps:
[0056] Step S11 , preparing a first transmission layer on the substrate of the transparent conductive substrate.
[0057] Step S12, preparing a first interface modification layer on the substrate deposited with the first transport layer by a solution method or a gas phase method by any one of spin coating, blade coating, slit continuous coating, spray coating or printing.
[0058] Step S13, preparing a perovskite precursor layer on the substrate deposited with the first interface modification layer by a solution method or a gas phase method by any one of spin coating, blade coating, slit continuous coating, spray coating or printing, The perovskite precursor layer contains one or more metal halides BX 2 .
[0059] Step S14 , preparing a perovskite reaction layer on the substrate for preparing the...
example 1
[0086] Example 1, a method for preparing a perovskite solar cell, please refer to the attached Figure 5 The schematic diagram of the internal structure of the perovskite solar cell shown includes the following steps:
[0087] (1) Clean a 5×5cm ITO glass plate with detergent, deionized water, acetone, and isopropanol for 30 minutes, and then use N 2 After drying, it was treated with UV O-zone for 10 minutes;
[0088] (2) Preparation of NiO x The thin film acts as a hole transport layer;
[0089] (3) 10nm 2-naphthalenethiol was deposited on the hole transport layer by slot coating method as the first interface modification layer, and 2-naphthalenethiol was dissolved in ethanol at a concentration of 0.5mol / L; figure 2 It is the chemical structure diagram of 2-naphthalene thiol;
[0090] (4) Preparation of doped or modified metal halide precursor: 461mg of PbI 2 (1mmol), dissolved in 1mL of DMF solution, add 70.9uL of anhydrous DMSO, heat and stir at 60°C for 2h, mix comple...
Embodiment 2
[0095] Embodiment 2, comprises the following steps:
[0096] (1) Clean the FTO glass plate sequentially with detergent, deionized water, acetone, and isopropanol for 30 minutes, and then use N 2 After drying, it was treated with UV O-zone for 10 minutes;
[0097] (2) Evaporate 10nm tungsten oxide film as the hole transport layer;
[0098] (3) Evaporate 20nm 5,7,12,14-pentacenetetraone on the hole transport layer as the first interface modification layer, and the evaporation temperature is 375°C; image 3 It is the chemical structure diagram of 5,7,12,14-pentacenetetraone;
[0099] (4) Preparation of doped or modified metal halide precursor: 461mg of PbI 2 (1mmol), dissolved in 1mL of DMF solution, add 70.9uL of anhydrous DMSO, heat and stir at 60°C for 2h, mix completely and set aside;
[0100] (5) Preparation of doped PbI by slot coating using the prepared precursor solution 2 film;
[0101] (6) Place the prepared metal halide film in the film forming chamber, and use a...
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