Metal bipolar plate for fuel cell and fabrication method of metal bipolar plate
A metal bipolar plate and fuel cell technology, which is applied in solid electrolyte fuel cells, battery electrodes, circuits, etc., can solve the problems of increasing the complexity of the structure and the difficulty of eliminating pinholes in a single-layer film, saving material costs, The effect of reducing the areal density number and improving the corrosion resistance
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Embodiment 1
[0025] For pretreatment, the 316L stainless steel substrate with a thickness of 0.1 mm is stamped and formed. The stainless steel substrates were ultrasonically cleaned in ethanol to remove surface grease. Then wash with an acid solution mixed with sulfuric acid and hydrofluoric acid at a volume ratio of 10:1 to remove the self-passivation film on the surface of the stainless steel substrate. save in .
[0026] To prepare a continuous insulating layer:
[0027] 1) Deposit chemical passivation layer: soak the stainless steel substrate in 30% nitric acid solution for passivation, keep the temperature at 50-60°C, take out the stainless steel substrate after 30 minutes, rinse it with deionized water two to three times, dry it and store it , the surface of the stainless steel substrate is passivated to form a dense passivation layer with a thickness of 40nm, hereinafter referred to as the chemical passivation layer. The chemical passivation layer is denser than the self-passivat...
Embodiment 2
[0038] The pretreatment steps are the same as in Example 1.
[0039] To prepare a continuous insulating layer:
[0040] 1) Pre-plating CrC layer: Put the stainless steel substrate into the vacuum sampling chamber, and send it to the substrate position of the vacuum chamber from the vacuum sampling chamber. The background vacuum degree of the vacuum chamber is kept at 10 -3 Pa, the heating temperature of the substrate is 200°C. At this temperature, not only the bonding force between the film and the stainless steel substrate can be improved, but also the stainless steel substrate can be guaranteed not to be deformed. The rotation speed of the substrate is 2rmp, the working gas argon carries the reaction gas acetylene into the vacuum chamber, the flow rate of acetylene is 50 sccm, the target material is chromium, the target current is 120A, and the bias voltage is 500V. After 1 minute of reaction, close the chromium target At this time, a layer of CrC is pre-plated on the surfa...
Embodiment 3
[0049] The pretreatment steps are the same as in Example 1.
[0050] To prepare a continuous insulating layer:
[0051] 1) Depositing a chemical passivation layer: the method is the same as in Example 1.
[0052] 2) Depositing the SnO layer: the stainless steel substrate with the chemical passivation layer deposited on the surface was ultrasonically cleaned in ethanol for 10 minutes to remove surface grease and dust, then washed twice with deionized water and dried.
[0053] Place the stainless steel substrate on the substrate in the vacuum chamber, and keep the background vacuum at 10 -4 Pa, facing the Sn target with a purity of 99.98%, the horizontal distance between the Sn target and the stainless steel substrate is kept at 20cm, and the substrate temperature is heated to 200°C. At this temperature, not only the bonding force between the film and the stainless steel substrate can be improved, Moreover, it can ensure that the stainless steel substrate will not be deformed....
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