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Solidified abrasive lapping polishing pad having self-modifying function and preparation method

A fixed abrasive, self-correcting technology, applied in grinding/polishing equipment, abrasives, grinding devices, etc., can solve the problems of abrasive splashing, uneven grinding cutting amount, abrasive waste processing efficiency, etc., to reduce surface roughness , Improve the mechanical properties, the effect of good workpiece flatness

Inactive Publication Date: 2008-01-02
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are some inherent shortcomings in the traditional free abrasive grinding and polishing system: when the grinding disc rotates fast, the abrasive will splash, resulting in waste of abrasive and low processing efficiency; waste liquid treatment costs are high; abrasives are randomly distributed on the polishing disc, Its distribution density is uneven, resulting in uneven grinding and cutting amount, and it is difficult to control the surface accuracy of the workpiece
Korean jae young choi et al. proposed a polishing pad with self-correcting function in a study on polishing of molds using hydraulic fixed abracie pad (Iitl.J.Mach.Tool Manufac.2004, (44): 1143), The abrasive used is a large-sized abrasive of about 1000 meshes. Although the grinding and polishing pad is not easy to clog, the surface roughness of the workpiece after processing is relatively high. The polishing pad contains too much polymer that does not participate in the photocuring process. Incomplete process that affects the ability of the pad substrate to support the abrasive

Method used

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  • Solidified abrasive lapping polishing pad having self-modifying function and preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Surface-modify the nano-cerium oxide abrasive with an average particle size of 20 nanometers with a silane coupling agent, weigh 2.5 grams of the above-mentioned surface-modified nano-cerium oxide, weigh 10 grams of polyurethane acrylate and 35 grams of polyether acrylate For the prepolymer formed, take 15 grams of performance regulator polyethylene glycol as the performance regulator, weigh 1 gram of free radical photoinitiator α-hydroxyalkyl phenone, and weigh 1 gram of polyethylene glycol dimethyl Acrylate: trimethylolpropane triacrylate is 36.5 grams of reactive diluent mixture of 1: 1, first mix other materials except photoinitiator evenly, then add photoinitiator, and stir again, make it uniform, Prepare a cleaned polycarbonate polymer substrate with a thickness of 1 mm, and apply the above-mentioned mixture evenly on the rigid polymer substrate by screen printing; pass through a UV curing machine at a speed of 2m / min to make the above-mentioned mixture solidified...

Embodiment 2

[0034] The diamond synthesized by the static pressure method is crushed and made into nano-diamonds with an average particle diameter of 100 nanometers, and 2 grams of the above-mentioned nano-diamonds are weighed, and the prepolymer composed of 28 grams of polyester acrylate and 50 grams of polyether acrylate is weighed. Take 10 grams of performance regulator polyethylene glycol as performance regulator, weigh photoinitiator α, α-dimethoxyl-α phenylacetophenone 2, g, bis (2,4,6-trimethyl Base benzoyl) phenyl phosphorus oxide 1 gram, take by weighing 5 grams of active diluent mixture with triethylene glycol bismethacrylate: trimethylolpropane trimethacrylate as 1: 1 in advance, in addition , weigh 2 grams of polydimethylsiloxane, first mix other substances except the photoinitiator evenly, then add the photoinitiator, and stir again to make it uniform, and prepare a clean polycarbonate polymer For the substrate, apply the above mixture evenly on the rigid polymer substrate by ...

Embodiment 3

[0039] Surface-modify the cerium oxide abrasive with an average particle size of 1.5 microns with a silane coupling agent, weigh 20 grams of the above-mentioned surface-modified cerium oxide, weigh 15 grams of bisphenol A epoxy acrylate and 20 grams of polyether The prepolymer composed of acrylate, weighed 1.5 grams of free radical photoinitiator α-hydroxyalkyl phenone, 0.5 grams of benzophenone, weighed in advance with neopentyl glycol diethoxy dimethacrylate: Trimethylolpropane triacrylate is 39.5 grams of a 1:1 reactive diluent mixture. First, mix other substances except the photoinitiator evenly, then add the photoinitiator, and stir again to make it uniform, and prepare a piece of processing A clean polycarbonate polymer substrate with a thickness of 1 mm, the above-mentioned mixture is evenly applied to the rigid polymer substrate by screen printing; the above-mentioned mixture is cured by a UV curing machine at a speed of 1m / min, and the obtained Fixed abrasive polishin...

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Abstract

The invention relates to a grinding and polishing pad of consolidation abrasive with self-adjusting function and the preparation method, belonging to ultra-precision grinding and polishing machining technical field, which is characterized in that components of the abrasive layer (3)comprises 1-20% by wt of abrasive with granularity of 1-40 nanometer, 20-80% by wt of acrylic pre-polymer, 1-3% by wt of free radical photo initiator, 0-2% by wt of poly (dimethylsiloxane) / acrylic polymer, 0-20% by wt of adjustment additive with system cross-linking density performance, and 5-40% by wt of acrylic active diluent. The preparation process comprises (1)mixing stock fully and uniformly, (2)preparing rigid polymer matrix, (3)daubing uniformly by screen-printing, and (4)solidifying by ultraviolet cured machine. The invention is provided with stable grinding and polishing performance and self-adjustment performance. It is suitable for precision machining.

Description

Technical field: [0001] The fixed abrasive grinding and polishing pad with self-correcting function and its preparation method relate to the technical field of ultra-precision grinding and polishing. Background technique: [0002] Due to the popularization of standards such as TD-SCDMA and the demands of the digital home appliance and network markets, China's semiconductor market will reach a scale of US$68.6 billion in 2008. LED is an ideal choice for color display and decorative lighting of portable electronic devices (mobile phones, etc.) due to its high efficiency, easy driving, small size, thinness, durability, low noise and low cost. Therefore, its substrate materials Sapphire (Al 2 o 3 ) soared in demand. With the rapid development of high-tech such as the Internet and mobile communications, laser crystals (such as ruby, titanium sapphire, YVO 4 Crystals, etc.), nonlinear optical crystals (such as KDP, KTP, BBO, LBO), piezoelectric crystals (crystals, lithium niob...

Claims

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Application Information

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IPC IPC(8): B24D3/32B24D18/00
Inventor 朱永伟左敦稳徐锋黎向锋沈建良邵建兵郭魂
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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