Copper foil excellent in adhesion with resin, method for manufacturing same, and printed wiring board or battery negative electrode material using electrolytic copper foil
A technology of electrolytic copper foil and manufacturing method, applied in non-aqueous electrolyte storage batteries, printed circuits, printed circuits, etc., can solve problems such as limited effect, increase peel strength, improve adhesion strength, and improve the roughening treatment layer. Effect
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Embodiment 1)
[0119] A treatment of forming roughened particles was performed on the rough surface of the copper foil using an IPC3 grade electrolytic copper foil having a thickness of 12 μm.
[0120] The plating bath composition and electrolytic treatment conditions of the treatment (electroplating) electrolytic solution for forming roughened particles are as follows.
[0121] (Electrolyte composition)
[0122] Cu: 15g / L
[0123] h 2 SO 4 : 100g / L
[0124] W addition amount: 3mg / L (added in the form of sodium tungstate dihydrate, the same below)
[0125] Addition amount of sodium decyl sulfate: 4mg / L
[0126] (Electrolyte temperature) 38°C
[0127] (current condition)
[0128] Current density: 54A / dm 2
[0129] Next, on the above-mentioned roughened surface, plating is performed with an electrolytic bath containing sulfuric acid / copper sulfate in order to prevent falling off of roughened particles and to increase peel strength. The processing conditions for plating are as follows...
Embodiment 1
[0146] The number of coarse particles measured in Example 1 (pieces / μm 2 ), particle size (average μm), surface roughness (Ra, Rt, Rz) and peel strength (BT substrate peel strength (kN / m): normal and welded peel strength) are shown in Table 1.
[0147] Table 1
[0148]
Embodiment 2)
[0150] A treatment of forming roughened particles was performed on the rough surface of the copper foil using an IPC3 grade electrolytic copper foil having a thickness of 12 μm.
[0151] The plating bath composition and electrolytic treatment conditions of the electrolytic solution in the roughened particle forming treatment (electroplating) are as follows.
[0152] (Electrolyte composition)
[0153] Cu: 15g / L
[0154] h 2 SO 4 : 100g / L
[0155] W addition amount: 3mg / L (added in the form of sodium tungstate dihydrate, the same below)
[0156] Addition amount of sodium decyl sulfate: 4mg / L
[0157] (Electrolyte temperature) 38°C
[0158] (current condition)
[0159] Current density: 54A / dm 2
[0160] Next, on the above-mentioned roughened surface, plating is performed with an electrolytic bath containing sulfuric acid / copper sulfate in order to prevent falling off of roughened particles and to increase peel strength. The processing conditions for plating are as follo...
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