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Low-melting-point high-tenacity ceramic material and preparation method and application thereof

A ceramic material and high toughness technology, applied in the field of low melting point high toughness ceramic materials, can solve the problems of unsatisfactory impact resistance of the coating, high energy consumption of metal substrates, easy damage, etc., to ensure low melting point And high toughness, simple process steps, and the effect of reducing energy consumption

Inactive Publication Date: 2011-09-14
李训竹
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] It is not limited to the ceramic materials disclosed by the above-mentioned exemplified documents, which are not enough to make the ceramic material have the dual effects of low melting point and high toughness at the same time, thus restricting the application of combining the ceramic material with the metal plate as the carrier, making " "Double-sided enamel" has become a difficult problem in the industry, because for brittle materials, no matter what kind of processing technology is used, the impact resistance of the resulting coating will not reach a satisfactory level, and it is easy to be damaged, especially at the edge.
Moreover, the traditional ceramic molding technology not only consumes a lot of energy but also has strict requirements on the metal substrate. carbon steel

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] A) batching and mixing, get the following raw materials by mass percentage: 60% silicon dioxide, 7.5% titanium dioxide, 7.2% aluminum oxide, 5.5% boron trioxide, 5.0% sodium oxide, 6.0% Lithium oxide, 3.0% antimony trioxide, 1.2% cobalt trioxide, 1.1% chromium trioxide, 1.5% nickel sesquioxide, 1.0% strontium oxide and 1.0% zinc oxide to obtain the raw material , and put the raw materials into the ball mill mixer, the rotating speed is 120rpm (120n / min), the mixing time is 40min, fully mixed to obtain the mixture;

[0028] B) Melting, introduce the mixture obtained in step A) into the electrode melting furnace for melting, after the temperature is 1200 ° C and the time is 45 minutes, the molten material is obtained. During the melting process, the center of the electrode will form a bottom-up circulation. Produce a natural stirring effect;

[0029] C) solidification, introducing the molten material obtained in step B) into water at 60°C for solidification to obtain a s...

application ) example 1

[0032] The low-melting-point high-toughness ceramic material obtained in Example 1 was sprayed onto the surface of the paddle blades of the agitator by electrostatic spraying, and then sent to an electric furnace for sintering. The sintering temperature was 650°C, and the sintering time was 8 minutes. Lower the temperature to 620°C and keep it warm for 30 minutes. This is the nanocrystal formation period. The nanocrystals are fully formed, and then naturally cooled to form a ceramic coating on the surface of the agitator blade.

Embodiment 2

[0034] A) batching and compounding, get following raw material by mass percentage ratio: 52% silicon dioxide, 8.3% titanium dioxide, 8.3% aluminum oxide, 7.5% boron trioxide, 6.0% sodium oxide, 5.5% Lithium Oxide, 4.0% Antimony Trioxide, 1.9% Cobalt Trioxide, 2.0% Chromium Trioxide, 1.0% Nickel Trioxide, 1.5% Strontium Oxide and 2.0% Zinc Oxide, Obtain the raw material, and put the raw material into the mixing device to fully mix, the rotating speed of the mixing device is 150rpm, the mixing time is 30min, and the mixed material is obtained;

[0035] B) melting, the melting temperature is 1100° C., and the melting time is 60 minutes to obtain the molten material;

[0036] C) curing, the water temperature is 80°C, to obtain a cured material;

[0037] D) Grinding, grinding to a particle size of 240nm to obtain a low-melting-point high-toughness ceramic material with the technical effects shown in Table 1.

[0038] The content not involved in this embodiment is the same as the ...

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Abstract

The invention discloses a low-melting-point high-tenacity ceramic material and a preparation method and application thereof, belonging to the technical field of industrial and civil ceramic materials. The ceramic material comprises the following components in percentage by mass: 48-60 percent of silicon dioxide, 7.2-8.3 percent of titanium dioxide, 7.2-8.3 percent of aluminum oxide, 5.5-7.5 percent of diboron trioxide, 5-6 percent of sodium oxide, 5.5-6.7 percent of lithium oxide, 3.0-4.0 percent of diantimony trioxide, 1.0-2.0 percent of cobalt sesquioxide, 1.0-2.0 percent of dichromium trioxide, 1.0-2.5 percent of nickel sesquioxide, 1.0-2.0 percent of strontium oxide and 1.0-3.0 percent of zinc oxide. The invention has the advantages that: over 50 percent of energy consumption can be reduced, the toughness can be improved, the process steps are simple, the process requirements are not severe, the technical effects of low melting point and high toughness of the ceramic material can be ensured, ceramic coatings can be formed on the surface of a workpiece or two faces of a steel plate in a simple way, and the problem of enameling on two faces of a reaction kettle in the prior art is solved.

Description

technical field [0001] The invention belongs to the technical field of industrial and civil ceramic materials, and in particular relates to a low-melting-point high-toughness ceramic material, and also relates to a preparation method of the material and an application of the low-melting-point high-toughness ceramic material prepared by the method. Background technique [0002] As is well known in the industry, enamel, ceramics and glass are common silicate materials. Taking enamel materials as an example, in the production process of industrial enamel equipment such as enamel reactor stirring devices, the formula of enamel materials determines Its own brittleness is large, so the problem of enameling both sides of the steel plate has not been solved so far, and then directly caused the enamel reaction agitator to be simple in form and low in function. In particular, high sintering temperature and manufacturing process can easily lead to the explosion of enamel equipment, whi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/14C04B35/622C23D11/00
Inventor 严巍李训竹
Owner 李训竹
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