The invention discloses a novel maskless photoetching
system and a technological process thereof. The novel maskless photoetching
system comprises a material number
system, an
exposure system, an RIP(
Raster Image Processing) module, a
data processing module, a position correcting module, a
light source module, an illumination system
optical module, a
graph generator, a master control module, an energy correcting module, a
projection lens module, an automatic focusing module, a motion platform module and an alignment module. Compared with a traditional maskless photoetching system, the material number system, the RIP module, the position correcting module, the energy correcting module, the automatic focusing module and the alignment module are added, so that the accuracy and the stabilityof the novel maskless photoetching system are increased, the efficiency and the yield of
product processing are increased, the production cost of a product is reduced, high-
automation large-scale production application can be realized, the novel maskless photoetching system is particularly suitable for being embedded to a
production line in an industry 4.0 grade, and intelligent, unmanned, continuous and stable production operation can be realized.