Production of ion liquid lubicating thin film
An ionic liquid, lubricating film technology, used in lubricating compositions, petroleum industry, silicon organic compounds, etc., to achieve good tribological properties, long wear life, and low friction coefficient.
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Embodiment 1
[0026] Preparation of Ionic Liquid Thin Films on Hydroxylated Monocrystalline Silicon Substrates:
[0027] 1. Pre-treat the single crystal silicon wafer, ultrasonically clean the single crystal silicon wafer polished on one side in acetone solvent for 15 minutes, blow dry with high-purity nitrogen, and place it in concentrated H with a volume ratio of 7:3. 2 SO 4 and 30% H 2 o 2 The solution was kept at 90°C for 2 hours, and then ultrasonically cleaned with distilled water. High-purity nitrogen is blown dry at high speed to obtain a clean surface hydroxylated single crystal silicon wafer.
[0028] 2. Prepare a dichloromethane solution of ionic liquid 1-hydroxyethyl-3-butylimidazolium hexafluorophosphate with a mass fraction of 0.2%. Using a homogenizer to control the rotation speed of the single crystal silicon wafer to 3000 rpm, drop the dichloromethane solution containing the ionic liquid onto the single crystal silicon wafer.
[0029] 3. Heat the sample at 120°C for ab...
Embodiment 2
[0036] Preparation of Ionic Liquid Films on Vinylized Glass Substrates:
[0037] 1. Utilize the method with embodiment 1 step 1 to obtain the glass sheet of surface hydroxylation.
[0038] 2. Immediately immerse the clean glass sheet after hydroxylation treatment in a toluene solution with a volume fraction of 0.2% vinyltriethoxysilane, and react at 70°C for 24 hours to obtain a glass sheet modified by self-assembly of terminal vinyl groups. Use 50ml Dichloromethane was ultrasonically cleaned three times to remove vinyltriethoxysilane not bonded to the substrate, and dried with high-purity nitrogen.
[0039] 3. Prepare a dichloromethane solution of ionic liquid 1-hydroxyethyl-3-hexylimidazole hexafluorophosphate with a mass fraction of 0.1%, and other operating steps are the same as step 2 of Example 1.
[0040] 4. The operation steps are the same as step 3 of embodiment 1.
[0041] The friction and wear test results of GCr15 steel balls show that: under the load of 0.5N~1.0...
Embodiment 3
[0044] Preparation of Ionic Liquid Thin Films on Clean Silicon Nitride Ceramic Substrates:
[0045] 1. Take a clean silicon nitride ceramic block as the base material.
[0046] 2. Prepare a dichloromethane solution of 0.5% ionic liquid 1-allyl-3-butylimidazolium hexafluorophosphate, and other operating steps are the same as Step 2 of Example 1.
[0047] 3. Heat the sample at 100°C for about 3 hours in the atmosphere. The thickness of the obtained thin film was about 20 nm. Observation with a scanning electron microscope shows that the surface of the film is very uniform.
[0048] The ionic liquid film prepared by this method is loaded at 0.5N and the speed is 160mm min -1 , the friction coefficient against GCr15 steel balls is stable at 0.06-0.10, and the wear life exceeds 3000 times.
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