Magnesium alloy non cyanogen plating copper chemical plating nickle and its plating process
A technology of electroless nickel plating and cyanide-free pre-plating of copper, which is applied in the coating process of metal materials, plating of superimposed layers, and coatings, etc. question
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0055] The material is AZ91D magnesium alloy, the specific operation steps are as follows:
[0056] (1) Pre-plating treatment
[0057] 1) Mechanical polishing The sample is removed with a grinder to remove burrs, scale, adhered release agent, various oil stains, reduce surface roughness, and wash to remove slag;
[0058] 2) Ultrasonic degreasing: Ultrasonic degreasing with acetone or trichlorethylene organic solvent, temperature: room temperature, time: 10min;
[0059] 3) Alkaline washing
[0060] Solution preparation and operating conditions are as follows: NaOH 50g dm -3 , Na 3 PO 4 12H 2 O 10g·dm -3 ;Temperature 60±5℃; Time 8-10min;
[0061] 4) pickling
[0062] Solution preparation and operating conditions are as follows: CrO 3 125g·dm -3 , HNO 3 (68%)110cm 3 · dm -3 ;Temperature 20℃; Time 1min;
[0063] 5) Activation:
[0064] Solution preparation and operating conditions are as follows: HF (40%) 385cm 3 · dm -3 ;Temperature 20℃; Time 15min;
[0065] 6) O...
Embodiment 2
[0078] The material is AZ91D magnesium alloy, which differs from Example 1 in that:
[0079] Pre-plated copper:
[0080] The formula of the plating solution for cyanide-free copper plating is: copper pyrophosphate 30g dm -3 ;Sodium pyrophosphate 100g·dm -3 , HEDP 60g·dm -3 ; Ammonium bifluoride 10g·dm -3 , NaF 5g·dm -3 ; Adjust the pH value to 11.0 with ammonia water; Cathode current density: initial current density 4A·dm -2 , time 3min; working current density 1A·dm -3 , time 20min;
[0081] (3) Acidic copper plating - three-layer nickel plating - chrome plating
[0082] 1) Acid copper plating
[0083] Solution preparation and operating conditions are as follows: copper sulfate (CuSO 4 .5H 2 O) 220g·dm -3 , sulfuric acid (H 2 SO 4 )(ρ=1.84g / l)36cm 3 · dm -3 , chloride ion (Cl - )90mg·dm -3 , cylinder opener 10cm 3 · dm -3 , leveling agent 0.5cm 3 · dm -3 , Brightener 0.5cm 3 · dm -3 Temperature 26°C; Cathode current density 5A·dm -2 , anode current den...
Embodiment 3
[0097] The material is AZ31B magnesium alloy, which differs from Example 1 in that:
[0098] pickling
[0099] CrO3 180g·dm -3 , Fe(NO 3 ) 3 9H 2 O 400g·dm -3 , NaF 3.5g·dm -3 ;Temperature 20℃; Time 10min;
[0100] activation
[0101] h 3 PO 4 (85%) 150-200g·dm -3 , NH 4 HF 2 80-100g·dm -3 ;Temperature 20℃;Time 2min
[0102] pre-plated copper
[0103] The plating solution formula for cyanide-free copper plating is: copper pyrophosphate 40g dm -3 , sodium pyrophosphate 60g·dm -3 , Trisodium citrate 60g·dm -3 , Sodium Potassium Tartrate 10g·dm -3 , ammonium bifluoride 10g·dm -3 , Sodium Fluoride 10g·dm -3 ; pH 9.0.
[0104] Cathode current density: initial current density 3A·dm -2 , time 5min; working current density 2A·dm -3 , time 30min.
[0105] Electroless Nickel
[0106] The formula of the plating solution is: 1) main salt nickel acetate 15g dm -3 ; 2) reducing agent sodium hypophosphite 30g dm -3 ; 3) Complexing agent trisodium citrate 2.5g dm ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com