Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Fluorine-doped diamond-like film, preparation method thereof and impressing template comprising fluorine-doped diamond-like film

A diamond film and fluorine technology, applied in the field of nano-processing, can solve the problems of low surface free energy, lack of hydrophobic properties, unsuitable for nano-imprint template anti-stick coating, etc., to reduce surface energy, improve hydrophobic performance and Anti-adhesion performance, the effect of improving the reuse rate

Inactive Publication Date: 2013-12-11
上海帕壳实业有限公司
View PDF5 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, pure DLC films, despite their low surface free energy, do not possess hydrophobic properties, making them unsuitable as anti-stick coatings for nanoimprint templates.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fluorine-doped diamond-like film, preparation method thereof and impressing template comprising fluorine-doped diamond-like film
  • Fluorine-doped diamond-like film, preparation method thereof and impressing template comprising fluorine-doped diamond-like film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] By plasma-enhanced chemical vapor deposition, the figure 1 It is a schematic diagram of the plasma-enhanced chemical vapor deposition device involved. Specifically, the soft template (polydimethylsiloxane) for nanoimprinting is placed in the chamber of the plasma device, and the vacuum is evacuated to 1.0×10 -3 Pa; then pass Ar gas to a vacuum of 2.0Pa, turn on the radio frequency power supply, the power of the radio frequency power supply is 100W, perform glow discharge, and use argon plasma to activate and clean the surface of the soft template; then pass CF 4 、CH 4 Mixed gas with Ar, CH 4 、CF 4 The mass flow percentages of Ar and Ar are 74%, 7%, and 19% respectively, so that the total pressure is 4.0Pa. Turn on the RF power supply. The power of the RF power supply is 200W. The mixed gas glow discharges to generate plasma. The discharge time is the deposition time. In 1 minute, the fluorine-doped diamond-like anti-adhesive film is deposited and formed on the imprin...

Embodiment 2

[0030] Using the plasma-enhanced chemical vapor deposition method, the hard template (silicon wafer) for nanoimprinting was placed in the chamber of the plasma device, and the vacuum was evacuated to 1.0×10 -3 Pa; then pass Ar gas to a vacuum of 2.0Pa, turn on the RF power supply, the power of the RF power supply is 100W, perform glow discharge, and use argon plasma to activate and clean the surface of the hard template; then pass CF 4 、CH 4 Mixed gas with Ar, CH 4 、CF 4 The mass flow percentages of Ar and Ar are 67%, 10%, and 23% respectively, so that the total pressure is 4.0Pa. Turn on the RF power supply. The power of the RF power supply is 200W. The mixed gas glow discharges to generate plasma. The discharge time is the deposition time. In 3 minutes, the DLC anti-adhesive film is deposited on the imprint template, the thickness of the anti-adhesive film is 10 nm, the fluorine content is 3%, and the deposition temperature is 200 degrees.

Embodiment 3

[0032] Using the magnetron sputtering method, place the hard template (quartz) for nanoimprinting in the vacuum sputtering chamber, use graphite with a purity of 99.99% as the target, and the operating frequency of the RF power supply is 13.56MHz, between the target cathode and the substrate stage The distance is about 40mm; vacuumize to 2.0×10 -3 Pa, enter Ar gas until the vacuum degree is 2.0Pa, turn on the RF power supply, the power of the RF power supply is 100W, perform pre-sputtering, and clean the target surface with argon plasma; then pass CHF 3 Gas until the working pressure is 4.0Pa, turn on the radio frequency power supply, the radio frequency power supply power is 150W, sputter the target material, the sputtering time is 5 minutes, promptly deposit the described DLC anti-adhesive film on the embossing template, the described anti-adhesive film The film thickness is 8nm, the fluorine content is 2%, and the deposition temperature is 25 degrees.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a fluorine-doped diamond-like film, a preparation method thereof and an impressing template comprising the fluorine-doped diamond-like film. The fluorine-doped diamond-like film is deposited on the surface of a substrate; the mass content of fluorine contained in the fluorine-doped diamond-like film is 1%-4%; the thickness of the fluorine-doped diamond-like film is 1-10 nanometers. The fluorine-doped diamond-like film disclosed by the invention has the advantages of a diamond-like film, also has the advantages of excellent hydrophobic property and anti-sticking property and good adhesion with the substrate, protects the structural integrity of the substrate, improves the reusing ratio of the substrate, is simple in preparation process and low in cost and can be applied to the anti-sticking treatment of the nanometer impressing template.

Description

technical field [0001] The invention belongs to the technical field of nano-processing, and in particular relates to a fluorine-doped diamond-like film, a preparation method thereof, and an embossing template containing the film. Background technique [0002] Nano-imprint lithography (Nano-imprint Lithography, NIL) is a new nano-patterning method proposed by Professor Stephen Y. Chou of the Nanostructure Laboratory of Princeton University in the United States in 1995. The imprint template (also known as mold, stencil) uses mechanical force (high temperature, high pressure) to imprint and replicate nanometer patterns in equal proportions on the silicon substrate coated with polymer materials. The resolution of nanoimprint lithography is only related to the pattern size of the imprint template, not physically limited by the shortest exposure wavelength of conventional optical lithography. Due to the outstanding advantages and huge commercial application potential of nanoimpri...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/26C23C16/505C23C14/06B82Y40/00
Inventor 石振李丰邓萌萌葛海雄杨立梅
Owner 上海帕壳实业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com