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40results about How to "Increase in inhibition area" patented technology

Semiconductor memory device and method of manufacturing the same

A contact connected to a word line is formed on a gate electrode of an access transistor of an SRAM cell. The contact passes through an element isolation insulating film to reach an SOI layer. A body region of a driver transistor and that of the access transistor are electrically connected with each other through the SOI layer located under the element isolation insulating film. Therefore, the access transistor is in a DTMOS structure having the gate electrode connected with the body region through the contact, which in turn is also electrically connected to the body region of the driver transistor. Thus, operations can be stabilized while suppressing increase of an area for forming the SRAM cell.

Semiconductor device, liquid discharge head, and liquid discharge apparatus

A semiconductor device which is provided to correspond to each of a plurality of nozzles discharging a liquid and controls a plurality of drive elements causing a liquid to be discharged from each nozzle by an application of a drive signal includes a detection circuit which detects a residual vibration signal of the drive element, an output terminal which is provided to correspond to each of the plurality of drive elements, a discharge transistor which controls an application of the drive signal to the drive element through the output terminal, and a detection transistor which controls an application of the residual vibration signal to the detection circuit through the output terminal, in which the detection transistor is smaller than the discharge transistor in size, and the discharge transistor is disposed between the detection transistor and the output terminal.
Owner:SEIKO EPSON CORP

Semiconductor integrated circuit

A multi-storage nonvolatile memory of high density, high speed and high reliability has a memory transistor and switch transistors disposed on both the sides of the memory transistor. The memory transistor includes a gate insulating film having discrete traps and a memory gate electrode, whereas the switch transistors include switch gate electrodes. The gate insulating film has the discrete traps for storing information charge, can locally inject carriers, and one memory cell constitutes a multi-storage cell for storing at least information of 2 bits. The switch transistors having the switch gate electrodes realize source side injection. The memory transistor is fommed together with the switch transistors in self-aligned diffusion. The memory gate electrode of the memory transistor is connected to a word line so as to perform word-line erase.
Owner:RENESAS ELECTRONICS CORP

Medical x-ray imaging system

The solid-state image pick-up device (1) includes a photodetecting section (10) which is formed by two-dimensionally aligning M×N (M and N are integers not less than 2) pixels in M rows and N columns and has a rectangular photodetecting surface. This solid-state image pick-up device (1) is supported rotatably by a rotation controlling section, and the rotation controlling section controls the rotation angle of the solid-state image pick-up device (1) so that the row direction or column direction of the photodetecting section (10) becomes parallel to the movement direction (B) of the solid-state image pick-up device (1) in one of the two imaging modes, and both of the row direction and the column direction of the photodetecting section (10) tilt with respect to the movement direction (B) of the solid-state image pick-up device (1) in the other imaging mode of the two imaging modes.
Owner:HAMAMATSU PHOTONICS KK

Semiconductor device and electronic device

An object is to provide a level shift circuit that operates stably. A semiconductor device includes a level shift circuit including first to fourth transistors and a buffer circuit. One of a source and a drain (S / D) of the first transistor is connected to one of a source and a drain of the second transistor. The other of the source and the drain of the second transistor is connected to one of a source and a drain of the third transistor. A gate of the first transistor and a gate of the fourth transistor are connected to the other of the source and the drain of the second transistor and the one of the source and the drain of the third transistor. A gate of the third transistor is connected to a wiring to which an input signal is input. An input terminal of the buffer circuit is connected to one of a source and a drain of the fourth transistor. An output terminal of the buffer circuit is connected to a gate of the second transistor and a wiring to which an output signal is output.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device

In a memory cell including CMOS inverters, an increase in an area of the memory cell caused by restrictions on a gate wiring due to a leakage current and restrictions due to design rules is suppressed. A first wiring and a second wiring are laid out as a first metal layer in the memory cell that includes a first inverter and a second inverter. The first wiring is connected with two drains in the first inverter and a second gate wiring in the second inverter. The second wiring is connected with two drains in the second inverter and a first gate wiring in the first inverter. The first wiring is laid out to overlap with the second gate wiring, and the second wiring is laid out to overlap with the first gate wiring. A second metal layer is laid out above the first metal layer, and a third metal layer is laid out above the second metal layer.
Owner:SEMICON COMPONENTS IND LLC

Semiconductor storage device

In a semiconductor storage device that includes memory cells each constituted by one transistor, two adjacent bits of the memory cells form a diffusion pattern (4), two adjacent transistors share a common source region, and the two drain regions are separated from each other. A plurality of arrays (120, 130) each including at least one line of the diffusion patterns (4) have bit lines that are independent for each array. In addition, end portions of the bit lines for each array are located on the two drain regions separated from each other with the common source regions interposed therebetween in one diffusion pattern (4) at an array-dividing border portion. With this, the area can be reduced while a sufficient separation width between the bit lines can be ensured.
Owner:SOCIONEXT INC

Medical instrument

A medical instrument includes a multilayer wiring board having first, second and third wirings, a fourth wiring formed in a first wiring layer, and a fifth wiring formed in a second wiring layer. A first via conductor electrically connects the third and fifth wirings. A second via conductor electrically connects the fourth and fifth wirings. The medical instrument further includes first and second transistors, a second transistor, and a capacitor mounted on the first wiring layer side of the multilayer wiring board. The drain and source electrodes of the first transistor are electrically connected to the first and second wirings, respectively. The drain electrode of the second transistor is electrically connected to the second wiring. The source electrode of the second transistor is electrically connected to the third wiring. The first and second electrodes of the capacitor are electrically connected to the first and fourth wirings, respectively.
Owner:COLUMBIA PEAK VENTURES LLC

Temperature measuring device and method for measuring temperature

A temperature measuring device includes first and second semiconductor elements each of which has a p-n junction, a transistor group including a plurality of transistors of which respective sources are connected to a power source and of which respective gates are connected to each other, the plurality of transistors constituting a current source, the transistor group being configured to output a first current and a second current having a different magnitude from the first current to the first and second semiconductor elements, respectively, and a selector configured to select at least one first transistor and a plurality of second transistors different from the first transistor, from among the plurality of transistors.
Owner:SOCIONEXT INC

Semiconductor device reducing leakage current of transistor

A semiconductor device includes: a first transistor having a control electrode coupled to an input node receiving a signal synchronized with a clock, a first conductive electrode coupled to an output node, and a second conductive electrode; a second transistor having a control electrode coupled to the input node, a first conductive electrode coupled to the output node, and a second conductive electrode coupled to a power supply node; and a first switch element connected between the power supply node and the second conductive electrode of the second transistor and turned on and off based on a first control signal indicating a detection result of a frequency of the clock.
Owner:RENESAS TECH CORP

Semiconductor device and electronic device

An object is to provide a level shift circuit that operates stably. A semiconductor device includes a level shift circuit including first to fourth transistors and a buffer circuit. One of a source and a drain (S / D) of the first transistor is connected to one of a source and a drain of the second transistor. The other of the source and the drain of the second transistor is connected to one of a source and a drain of the third transistor. A gate of the first transistor and a gate of the fourth transistor are connected to the other of the source and the drain of the second transistor and the one of the source and the drain of the third transistor. A gate of the third transistor is connected to a wiring to which an input signal is input. An input terminal of the buffer circuit is connected to one of a source and a drain of the fourth transistor. An output terminal of the buffer circuit is connected to a gate of the second transistor and a wiring to which an output signal is output.
Owner:SEMICON ENERGY LAB CO LTD
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