Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sulfonium sulfonate salt photoacid generator synthesized from cedrol and synthesis method for sulfonium sulfonate salt photoacid generator

The technology of a photoacid generator and a synthesis method is applied in the preparation of sulfonates, photosensitive materials for optomechanical equipment, organic chemistry, etc., which can solve the problems such as the inability to reduce edge roughness, and achieve easy preparation and generation, good transparency. , Improve the effect of edge roughness

Pending Publication Date: 2020-05-12
上海博栋化学科技有限公司
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing photoacid generators still have the problem of acid diffusion, which makes it impossible to reduce the edge roughness

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sulfonium sulfonate salt photoacid generator synthesized from cedrol and synthesis method for sulfonium sulfonate salt photoacid generator
  • Sulfonium sulfonate salt photoacid generator synthesized from cedrol and synthesis method for sulfonium sulfonate salt photoacid generator
  • Sulfonium sulfonate salt photoacid generator synthesized from cedrol and synthesis method for sulfonium sulfonate salt photoacid generator

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] This embodiment provides a kind of sulfonate sulfonium salt photoacid generator synthesized by cederyl alcohol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0041]

[0042] It specifically includes the following steps:

[0043] S1. Sodium hydroxide (7g, 175mmol) was dissolved in water (18g) to form a solution; methyl fluorosulfonyl difluoroacetate (10g, 52mmol) was added to ice water (25g) to obtain a reaction solution, and Slowly add the prepared sodium hydroxide solution to the above reaction solution under stirring. After the addition, the reaction solution is stirred in an ice bath (control temperature below 10 degrees Celsius) for 2.5 hours, and then continue to stir at room temperature for 1 hour. , start heating, make the temperature rise to 95 degrees Celsius in 30 minutes, and stir at 95 degrees Celsius for 3 hours, stop heating, cool to room temperature, neutralize with hydrochloric acid, filter the reaction solut...

Embodiment 2

[0048] This embodiment provides a kind of sulfonate sulfonium salt photoacid generator synthesized by cederyl alcohol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0049]

[0050] It specifically includes the following steps:

[0051] S1. Under the protection of nitrogen at 0°C, add pyridine (9.5g, 120mmol), bis(trichloromethyl)carbonate (5.0g, 17mmol) into dichloromethane (300g), and slowly add it under stirring Cedaryl alcohol 2-1 (10.0g, 45mmol) to obtain a reaction solution; then, the reaction solution was stirred at room temperature for 3 hours, and then 1,1-difluoro-2-hydroxyl-ethanesulfonic acid sodium salt (8.8g , 48mmol) was added to the reaction solution, stirred for 10 hours, the reaction solution was concentrated under vacuum to obtain a mixture, and n-heptane (120g) was added, and a solid was obtained by filtration. The solid was added to acetonitrile (120g), stirred and dissolved, and the filtrate was collected by fi...

Embodiment 3

[0054] This embodiment provides a kind of sulfonate sulfonium salt photoacid generator synthesized by cederyl alcohol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0055]

[0056] It specifically includes the following steps:

[0057] S1. Under nitrogen at 0°C, sodium hydride (1.2g, 50mmol) was slowly added to a mixture of cedaryl alcohol 3-1 (10g, 45mmol) and anhydrous tetrahydrofuran (200g), and stirred for 20 minutes; then, Ethyl bromoacetate (8 g, 48 mmol) was added dropwise to the above mixture, and stirred for 20 minutes; then, stirred at 25° C. for 6 hours for reaction, and quenched by adding water at 0° C. after the reaction was completed. The quenched mixed solution was concentrated by rotary evaporation, extracted three times with dichloromethane (50g×3), the organic phases were combined, washed with saturated brine (100g), dried over anhydrous sodium sulfate, and concentrated by rotary evaporation to obtain the crude pr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a sulfonium sulfonate salt photoacid generator synthesized from cedrol and a synthesis method for the sulfonium sulfonate salt photoacid generator, belonging to the fields of chemical synthesis and photoetching materials. The photoacid generator has a structural general formula which is described in the specification. In the structural general formula, R1 is one selected from the group consisting of groups which are described in the specification; and R2 is one selected from the group consisting of a covalent bond, an alkyl group, a cycloalkyl group, an ester group-containing alkyl group and a fluorine-containing alkyl group. The synthesis method for the photoacid generator comprises the following steps: allowing the cedrol to react with a sulfonate compound so as to obtain an intermediate; and allowing the intermediate to react with (cyclohexyl-1,5-dienyloxy)-trimethyl-silane, tetramethylene sulfoxide and trifluoroacetic anhydride so as to obtain the sulfoniumsulfonate salt photoacid generator. According to the invention, a raw material, namely the cedrol has large molecular weight, so the photoacid generator formed by the cedrol also has large molecular weight; diffusion of the photoacid generator can be reduced; and improvement of the edge roughness, reduction of the line width roughness and improvement of the resolution ratio are facilitated.

Description

technical field [0001] The invention relates to the fields of chemical synthesis and photolithography materials, in particular to a sulfonium sulfonium salt photoacid generator synthesized from cedaryl alcohol and a synthesis method thereof. Background technique [0002] Photolithography technology refers to the chemical sensitivity of photoresist materials (especially photoresist) under the action of visible light, ultraviolet rays, electron beams, etc., through exposure, development, etching and other processes, the design on the mask plate Graphics microfabrication technology that transfers graphics to the substrate. [0003] The development of lithography technology is inseparable from the development of lithography materials, and the development of lithography materials determines the development and application of lithography technology to a certain extent. Photolithographic materials (especially photoresist), also known as photoresist, are the most critical functiona...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C07D333/46C07C303/32C07C309/17C07C309/12G03F7/004
CPCC07C303/32C07C309/12C07C309/17C07C2603/78C07D333/46G03F7/004
Inventor 郭颖潘惠英喻珍林李嫚嫚王尹卓
Owner 上海博栋化学科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com