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A method for preparing a large-area surface-enhanced Raman scattering substrate

A surface-enhanced Raman and large-area technology, applied in Raman scattering, material excitation analysis, instruments, etc., to achieve simple operation, high surface-enhanced Raman scattering effect, and high stability

Inactive Publication Date: 2019-11-22
GUIZHOU EDUCATION UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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  • A method for preparing a large-area surface-enhanced Raman scattering substrate
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Embodiment 1

[0024] Example 1: A method for preparing a large-area surface-enhanced Raman scattering substrate. The SERS substrate that can be prepared by a simple method can reach an area of ​​3.5 cm×3.5 cm. The specific method includes the following steps:

[0025] 1) Polystyrene powder (48 kg / mol, dispersity 1.02) is dissolved in toluene, and a mixed solution of 2 mg / ml is prepared. Cut the circular single crystal silicon wafer into square silicon wafers with a size of 3.5cm×3.5cm with a glass knife; 2 SO 4 , 30%H 2 o 2 and deionized water according to the volume ratio of 100 / 35 / 15 in a certain volume of cleaning solution, boiled at 80 ℃ for 30 minutes; then, rinsed with deionized water, put it into a plastic beaker, and added 20% hydrogen fluoride A mixed solution of acid and deionized water, the volume ratio is 1:1; use hydrofluoric acid to remove the oxide layer on the silicon substrate; finally, rinse with deionized water, and blow dry with high-purity nitrogen for later use.

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Embodiment 2

[0033] Example 2: A method for preparing a large-area surface-enhanced Raman scattering substrate. The area of ​​the SERS substrate that can be prepared by a simple method can reach 3.5cm×3.5cm. The specific method includes the following steps:

[0034] 1) Polymethyl methacrylate powder (molecular weight: 50 kg / mol, dispersion: 1.1) is dissolved in toluene, and a mixed solution of 2 mg / ml is prepared. Cut the circular monocrystalline silicon wafer into square silicon wafers with a size of 3.5cm×3.5cm with a glass knife; place the cut silicon wafers in a 80% H 2 SO 4 , 30%H 2 o 2 and deionized water according to the volume ratio of 100 / 35 / 15 in a certain volume of cleaning solution, boiled at 80 ℃ for 30 minutes; then, rinsed with deionized water, put it into a plastic beaker, and added 20% hydrogen fluoride A mixed solution of acid and deionized water, the volume ratio is 1:1; use hydrofluoric acid to remove the oxide layer on the silicon substrate; finally, rinse with dei...

Embodiment 3

[0042] Example 3: A method for preparing a large-area surface-enhanced Raman scattering substrate. The area of ​​the SERS substrate that can be prepared by a simple method can reach 3.5cm×3.5cm. The specific method includes the following steps:

[0043] 1) Polymethyl methacrylate powder (molecular weight 50 kg / mol, dispersity 1.1) and polystyrene powder (48kg / mol, dispersity 1.02) are mixed and dissolved in toluene at a mass ratio of 2:8, and the configuration is 2 mg / mol ml of mixed solution. Cut the circular monocrystalline silicon wafer into square silicon wafers with a size of 3.5cm×3.5cm with a glass knife; place the cut silicon wafers in a 80% H 2 SO 4 , 30%H 2 o 2 and deionized water according to the volume ratio of 100 / 35 / 15 in a certain volume of cleaning solution, boiled at 80 ℃ for 30 minutes; then, rinsed with deionized water, put it into a plastic beaker, and added 20% hydrogen fluoride A mixed solution of acid and deionized water, the volume ratio is 1:1; us...

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Abstract

A preparation method of a large-area surface-enhanced Raman scattering substrate is characterized in that uniformly distributed macromolecule nanostructures with the particle size being 78 nm and the spacing being 80 nm are prepared through dewetting of a polystyrene and polymethyl methacrylate mixed film in a mixed solvent of butanone, acetone and water in the volume ratio being 7: 3: 15 and taken as a substrate, a 30 nm silver layer is vertically sputtered, and the surface-enhanced Raman scattering substrate with the area reaching 3.5 cm*3.5cm is prepared. Dewetting of the macromolecule mixed film in the solvent and a magnetron sputtering evaporation method are firstly combined for preparation of the large-area surface-enhanced Raman scattering substrate, the preparation method of the surface-enhanced Raman scattering substrate is enriched, an application approach is provided for dewetting of the macromolecule mixed film, and the preparation method is simple to operate and good in repeatability and has potential economic and social benefits.

Description

technical field [0001] The invention relates to the technical field of nanometer surface and its preparation, in particular to a method for preparing a large-area surface-enhanced Raman scattering substrate. Background technique [0002] As an important modern spectroscopic technique, Raman spectroscopy has been widely used in many fields such as chemistry, biology, mineralogy, materials science, environmental science and archaeology. It has become an important tool for the study of molecular structure, environmental pollutant detection, biomolecular detection and material microstructure research. [0003] Since 1974, the British scientist Fleischmann et al. found that the spectral line intensity of the Raman spectrum of pyridine molecules was significantly enhanced on the Ag electrode with electrochemically rough micro-nano structure. This phenomenon has aroused widespread interest in the scientific community, and named this phenomenon Surface Enhanced Raman Scattering, or...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/65
CPCG01N21/658
Inventor 徐林张欢欢赵雪宇陈正件张贵鑫牟红兰钱定丹
Owner GUIZHOU EDUCATION UNIV
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