Carbon material surface silicon carbide nanowhiskers and preparation method thereof
A nano-whisker, silicon carbide technology, applied in the fields of nanotechnology, nanotechnology, nanotechnology for materials and surface science, can solve the problems of high price and high preparation cost, achieve environmental friendliness, mild reaction conditions, excellent The effect of photoluminescence properties
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Embodiment 1
[0030] A silicon carbide nano whisker on the surface of a carbon material and a preparation method thereof. The concrete steps of this embodiment are:
[0031] Step 1. According to the molar ratio of silicon powder: silicon dioxide powder is 1: (0.25~1), the silicon powder and silicon dioxide powder are evenly mixed to obtain a silicon source.
[0032] Step 2. Put the pitch-based carbon fiber in a high-temperature graphitization furnace, and pass in argon gas for high-temperature carbonization treatment. The temperature of the high-temperature carbonization treatment is 1000-1600 ° C, and the time of the high-temperature carbonization treatment is 0.5-1 hour to obtain a carbon source.
[0033] Step 3. According to the molar ratio of the silicon source: the carbon source being 1: (0.25~1), the silicon source and the carbon source are placed in a graphite crucible in turn, and then the graphite crucible is put into In the high-temperature carbonization furnace, vacuumize to 5~2...
Embodiment 2
[0037] A silicon carbide nano whisker on the surface of a carbon material and a preparation method thereof. The concrete steps of this embodiment are:
[0038] Step 1. According to the molar ratio of silicon powder: silicon dioxide powder is 1: (1~2), the silicon powder and silicon dioxide powder are evenly mixed to obtain a silicon source.
[0039] Step 2. Put the pitch-based carbon fiber felt in a high-temperature graphitization furnace, and pass in argon gas to carry out high-temperature carbonization treatment. The temperature of high-temperature carbonization treatment is 1600-2200 ° C, and the time of high-temperature carbonization treatment is 0.5-1 hour to obtain carbon source .
[0040] Step 3. According to the silicon source: the molar ratio of the carbon source is 1: (1~2), the silicon source and the carbon source are sequentially placed in a graphite crucible, and then the graphite crucible is put into In the high-temperature carbonization furnace, vacuumize to 5...
Embodiment 3
[0044] A silicon carbide nano whisker on the surface of a carbon material and a preparation method thereof. The concrete steps of this embodiment are:
[0045] Step 1. According to the molar ratio of silicon powder: silicon dioxide powder is 1: (2~3), the silicon powder and silicon dioxide powder are evenly mixed to obtain a silicon source.
[0046] Step 2. Put the pitch-based carbon fiber in a high-temperature graphitization furnace, and pass in argon gas to carry out high-temperature carbonization treatment. The temperature of high-temperature carbonization treatment is 2200-2800 ° C, and the time of high-temperature carbonization treatment is 0.5-1 hour to obtain carbon source.
[0047] Step 3. According to the silicon source: the molar ratio of the carbon source is 1: (3~4), the silicon source and the carbon source are sequentially placed in a graphite crucible, and then the graphite crucible is put into In the high-temperature carbonization furnace, vacuumize to 5~20Pa, ...
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