31results about How to "Low volume shrinkage" patented technology

The present invention relates to a process for preparing a precursor solution for polyimide / silica composite material and a process for forming a polyimide / silica composite material film on a substrate, comprising adding a monomer of a silane compound to allow a poly(amic acid) to carry a silica moiety; adding a monomer of formula (R6)xSi(R7)(4-x) to allow the silica moiety to carry a photo-polymerizable unsaturated group; and adding a monomer of formula R8N(R9)2 to allow the poly(amic acid) to carry a photo-polymerizable unsaturated group, where R6, R7, R8, R9, and x are as defined in the specification. The present invention also relates to a precursor solution for polyimide / silica composite material and a polyimide / silica composite material. The composite material of the present invention is useful in microelectronic devices, semiconductor elements, and photoelectric elements.

A film-forming composition including a triazine ring-containing hyperbranched polymer with a repeating unit structure indicated by formula (1), and inorganic micro particles is provided. This enables the provision of a film-forming composition capable of hybridizing without reducing dispersion of the inorganic micro particles in a dispersion fluid, capable of depositing a coating film with a high refractive index, and suitable for electronic device film formation.(In the formula, R and R′ are mutually independent and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar indicates a divalent organic group including either an aromatic ring or a heterocyclic ring, or both.)

This film-forming composition includes, for example, a polymer, crosslinking agent and light-diffusing agent that contain a triazine ring-containing repeating unit structure such as that represented formula (17), and is able to provide cured films with good light diffusing properties. Furthermore, this film-forming composition, which includes the same polymer, crosslinking agent and fine inorganic particles having a cross-linkable functional group, is able to provide cured films with good high temperature and high humidity resistance.

Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time.The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below;(wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond) in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.

An encapsulant composition has a silica containing inorganic-organic nano-hybrid matrix, particles of refractory ceramics suspended in the inorganic-organic nano-hybrid matrix, and, optionally, glass or ceramic fibres. The encapsulant may also contain ceramic coated metallic particles, and in some embodiments, a solvent or binder. The formulations can include a solvent, which may be removed during a curing process, or may be solvent-less

A film-forming composition that contains a tricarbonyl-benzene hyperbranched-polymer cross-linker and a triazine-containing hyperbranch, as shown for example in the formula, can form a thin film that excels in terms of hardness and heat tolerance and exhibits a reduced decrease in index of refraction despite the addition of the cross-linker.

A carbon material dispersed film formation composition including: a polymer that includes a triazine ring-containing repeating unit structure, such as that represented by formula (17) for example; a cross-linking agent; and a carbon material. The carbon material is well dispersed in the composition, and therefore by using this composition, a cured film in which the carbon material is well dispersed can be produced.

Provided is a triazine ring-containing hyperbranched polymer comprising the repeating unit structure represented by formula (1) and having one or more triazine ring terminals, said one or more triazine ring terminals being capped with a compound that differs from the diamine compound serving as the starting material for the polymer and has at least two active hydrogen groups. In addition to the polymer itself exhibiting high heat resistance, high transparency, a high refractive index, high light resistance, high solubility, and low volume shrinkage, it is also possible to use the polymer to provide a composition for film formation capable of yielding a thick film having high hardness.(In formula (1), R and R′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar represents a divalent organic group containing an aromatic ring and / or a heterocyclic ring.)

A photocationic polymerization initiator comprising (A) a photo acid-generating compound and (B) a fused polycyclic aromatic compound, wherein said fused polycyclic aromatic compound has a molecular structure in which a fused aromatic ring is further condensed with a non-aromatic ring, and at least one of the atoms constituting said non-aromatic ring directly bonded to a common atom in the fused aromatic ring and the non-aromatic ring, is a saturated carbon atom, said saturated carbon atom having at least one hydrogen atom. Upon blending the photopolymerizable monomer with the photocationic polymerization initiator, there is obtained a photocationically polymerizable composition having a high sensitivity for the visible light rays, which is useful for dental applications, exhibiting a sufficiently high curing rate and offering sufficient depth of curing upon the irradiation with light for only a short period of time.

A process for preparing a precursor solution for polyimide / silica composite material and a process for forming a polyimide / silica composite material film on a substrate, including adding a monomer of a silane compound to allow a poly(amic acid) to carry a silica moiety; adding a monomer of formula (R6)xSi(R7)(4−x) to allow the silica moiety to carry a photo-polymerizable unsaturated group; and adding a monomer of formula R8N(R9)2 to allow the poly(amic acid) to carry a photo-polymerizable unsaturated group, where R6, R7, R8, R9, and x are as defined in the specification. Also, a precursor solution for polyimide / silica composite material and a polyimide / silica composite material. The composite material is useful in microelectronic devices, semiconductor elements, and photoelectric elements.

Carbosilane monomers that include the following structural features: at least two Si-arylene bonds; at least one (meth)acrylate moiety; no Si—O bonds; and preferably at least two silicon atoms.

This film-forming composition includes, for example, a polymer, crosslinking agent and light-diffusing agent that contain a triazine ring-containing repeating unit structure such as that represented formula (17), and is able to provide cured films with good light diffusing properties. Furthermore, this film-forming composition, which includes the same polymer, crosslinking agent and fine inorganic particles having a cross-linkable functional group, is able to provide cured films with good high temperature and high humidity resistance.

Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below:wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.

Disclosed is a triazine ring-containing hyperbranched polymer containing a repeating unit structure represented by the expression (1). By this means, it is possible to achieve a triazine ring-containing polymer which, alone, has high heat resistance, high transparency, high refractive index, high light resistance, high solubility, low volume shrinkage without adding metal oxides; and also a membrane-forming composition containing the same.(In the formula, R and R′ represent independently a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and A represents an alkylene group optionally having a branched or alicyclic structure of 1 to 20 carbon atoms.)

A film-forming composition including a triazine ring-containing hyperbranched polymer with a repeating unit structure indicated by formula (1), and inorganic micro particles is provided. This enables the provision of a film-forming composition capable of hybridizing without reducing dispersion of the inorganic micro particles in a dispersion fluid, capable of depositing a coating film with a high refractive index, and suitable for electronic device film formation.(In the formula, R and R′ are mutually independent and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar indicates a divalent organic group including either an aromatic ring or a heterocyclic ring, or both.)

For example, a thin film which has a high refractive index and which it is possible to form a fine pattern can be obtained by using a composition that contains a triazine-ring-containing polymer that includes a repeating unit structure represented by formula [5].

A film-forming composition including a triazine ring-containing hyperbranched polymer with a repeating unit structure Indicated by formula (1), and inorganic micro particles is provided. This enables the provision of a film-forming composition capable of hybridizing without reducing dispersion of the inorganic micro particles in a dispersion fluid, capable of depositing a coating film with a high refractive index, and suitable for electronic device film formation.In the formula, R and R′ are mutually independent and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar indicates a divalent organic group including either an aromatic ring or a heterocyclic ring, or both.

Provided is a triazine ring-containing hyperbranched polymer comprising the repeating unit structure represented by formula (1) and having one or more triazine ring terminals, said one or more triazine ring terminals being capped with a compound that differs from the diamine compound serving as the starting material for the polymer and has at least two active hydrogen groups. In addition to the polymer itself exhibiting high heat resistance, high transparency, a high refractive index, high light resistance, high solubility, and low volume shrinkage, it is also possible to use the polymer to provide a composition for film formation capable of yielding a thick film having high hardness.(In formula (1), R and R′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar represents a divalent organic group containing an aromatic ring and / or a heterocyclic ring.)

The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a soft NIL process used for providing a sol-gel patterned layer on a substrate. Specifically, this process comprises a step of adjusting the solvent uptake of the sol-gel film to 10 to 50% vol., preferably between 15 and 40% vol., by varying the relative pressure of the solvent while a soft mould is applied onto the substrate coated with the sol-gel film.

It is possible to obtain a thin film that can form a minute pattern and that has a high index of refraction by using a polymer containing a triazine ring and containing a repeating unit structure represented for example by formula (22) or (26).

For example, a thin film which has a high refractive index and which it is possible to form a fine pattern can be obtained by using a composition that contains a triazine-ring-containing polymer that includes a repeating unit structure represented by formula [5].

With a photocurable composition for film formation which comprises a polymer containing a repeating unit structure having a triazine ring, for example, one represented by the following formula (17), a crosslinking agent, an ultraviolet absorber, and a light stabilizer, it is possible to produce a cured film which has a high refractive index and satisfactory weatherability.

A film-forming composition for ink-jet coating which comprises: a triazine-ring-containing polymer including, for example, the repeating unit structure represented by the following formula [3]; and an organic solvent comprising more than 50 mass % solvent based on a glycol dialkyl ether. The composition is less apt to corrode the heads of ink-jet coating devices, and droplets thereof are satisfactorily ejected in ink-jet coating. Therefore, with the composition, it is possible to easily produce a high-refractive-index film according to a desired pattern through pattern printing by an ink-jet coating device.

With a photocurable composition for film formation which comprises a polymer containing a repeating unit structure having a triazine ring, for example, one represented by the following formula (17), a crosslinking agent, an ultraviolet absorber, and a light stabilizer, it is possible to produce a cured film which has a high refractive index and satisfactory weatherability

A method of encapsulating an electrical winding in an encapsulant composition. The method includes: (i) providing an electrically insulated wire; (ii) applying the encapsulation composition to the electrically insulated wire to encapsulate the wire; and (iii) winding a further layer of wire around the encapsulated wire. The electrical encapsulant composition includes a silica containing inorganic-organic nano-hybrid matrix, and particles of refractory ceramic suspended in the inorganic-organic nano-hybrid matrix.

A triazine-ring-containing polymer characterized by including a repeating unit structure represented by formula (1).[In the formula, R and R′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, andAr represents at least one selected from the group shown by formulas (2) and (3).[in the formulas, W1 and W2 each independently represent CR1R2 (R1 and R2 each independently represent a hydrogen atom or a C1-10 alkyl group optionally substituted by a halogen atom (where these together may form a ring)), C═O, S, SO, or SO2.]]

An encapsulant composition comprises a silica containing inorganic-organic nano-hybrid matrix, particles of refractory ceramics suspended in the inorganic-organic nano-hybrid matrix, and, optionally, glass or ceramic fibres. The encapsulant may also contain ceramic coated metallic particles, and in some embodiments, a solvent or binder. The formulations can include a solvent, which may be removed during a curing process, or may be solvent-less.

It is possible to obtain a thin film that can form a minute pattern and that has a high index of refraction by using a polymer containing a triazine ring and containing a repeating unit structure represented for example by formula (22) or (26).

Disclosed is a triazine ring-containing hyperbranched polymer containing a repeating unit structure represented by the expression (1). By this means, it is possible to achieve a triazine ring-containing polymer which, alone, has high heat resistance, high transparency, high refractive index, high light resistance, high solubility, low volume shrinkage without adding metal oxides; and also a membrane-forming composition containing the same.In the formula, R and R′ represent independently a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and A represents an alkylene group optionally having a branched or alicyclic structure of 1 to 20 carbon atoms.

The invention discloses a water-based epoxy modified water-based polyurethane ink linking material and a preparation method thereof. The linking material is obtained by reacting a water-based epoxy resin, a polyurethane prepolymer and an end-capping agent; the specific preparation process is to mix polyester diol with toluene Addition polymerization of diisocyanate to obtain an intermediate; the intermediate reacts with dimethylol propionic acid and 1,4-butanediol in turn to obtain a polyurethane prepolymer; the polyurethane prepolymer and water-based epoxy After the resin undergoes grafting reaction, add an end-capping agent to end the end, and then obtain a water-based epoxy polyurethane ink binder with excellent performance. It is used in inks to show short drying time, excellent water resistance, high gloss, and good printing adaptability. And other advantages, especially suitable for printing substrates such as PVC, PET, aluminum foil, etc.