Preparation method of quartz ceramic hollow roller rod for tempered glass heating furnace
A technology of quartz ceramics and tempered glass, which is applied in glass manufacturing equipment, glass transportation equipment, glass tempering, etc. It can solve the problems of affecting the use effect, low densification degree, and disclosure of product strength, and achieves convenient operation and densification degree Effect of high and low apparent porosity
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[0027] see figure 1 , the embodiment of the present invention provides a technical solution: a preparation method of a quartz ceramic hollow roller for a tempered glass heating furnace, the specific preparation method includes the following steps,
[0028] S1, select quartz mixed raw materials: including silicon nitride and silicon dioxide, the proportion of silicon nitride is 0.5%-5.5%, and the proportion of silicon dioxide is 94.5%-99.5%;
[0029] S2, for the raw material abrasive: Put the granules, pure water and water reducer together into the ball mill for wet grinding for 15-30 hours, then discharge the material, heat the raw materials to melt and stir them fully, and keep the melting temperature at 1300-1450°C to obtain melting Quartz mixed raw materials;
[0030] S3. Preparation of colloidal slurry: put the wet-milled slurry, organic colloid, catalyst, surfactant together with fused silica mixed raw materials into a mixer and stir evenly to make a colloidal slurry;
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Embodiment 1
[0042] Select quartz mixed raw materials: including silicon nitride and silicon dioxide, the proportion of silicon nitride is 5.5%, the proportion of silicon dioxide is 94.5%, and the particle size of silicon dioxide is: 0.4mm-50%, Particle size: 0.2mm-30%, particle size: <0.1mm-20%;
[0043] For the raw material abrasive: put the granular material together with purified water and water reducer into the ball mill for wet grinding for 30 hours, then discharge the material, heat the raw material to melt and stir it fully, and keep the melting temperature at 1450°C to obtain the mixed raw material of fused quartz;
[0044] Preparation of colloidal slurry: Put the wet-milled slurry, organic colloid, a mixture of potassium nitrate and silicic acid, sodium dodecyl diphenyl ether disulfonate and fused quartz mixed raw materials into a mixer and stir evenly. The speed is controlled at 120r / min, and the temperature is controlled above 1200°C to make colloidal slurry;
[0045] Forming,...
Embodiment 2
[0049] Select quartz mixed raw materials: including silicon nitride and silicon dioxide, the proportion of silicon nitride is 0.5%-5.5%, the proportion of silicon dioxide is 94.5%, and the proportion of silicon dioxide is 94.5%. The mass percentage of preparation is: particle size: 0.2mm-40%, particle size: 0.1mm-30%, particle size: <0.1mm-30%;
[0050]For the raw material abrasive: Put the granular material, pure water and water reducing agent together into the ball mill for wet grinding for 15 hours, and then discharge the material, and heat the raw material to melt and fully stir, keeping the melting temperature at 1300°C to obtain the mixed raw material of fused quartz, which is During the milling process, you can also continuously inject pure water with a concentration of 17%. After adding pure water, add sodium bicarbonate water with a concentration of 78% to fully wet mill;
[0051] Preparation of colloidal slurry: a mixture of wet-milled slurry, organic colloid, potass...
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