Nano composite ceramic coating, pressure casting die and preparation method of pressure casting die
A nano-composite and ceramic coating technology, which is applied in coatings, casting molding equipment, metal material coating technology, etc., can solve problems such as corrosion failure life, fragmentation failure, thermal fatigue failure, etc.
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[0036] The present invention also provides a method for preparing a die-casting mold, comprising:
[0037] Step 1: Pretreating the die-casting mold base 1;
[0038] Step 2: Deposit a Cr metal bonding layer 2-1 on the surface of the pretreated die-casting mold substrate 1 obtained in Step 1;
[0039] Step 3: Depositing a CrN transition layer 2-2 on the surface of the Cr metal bonding layer 2-1 obtained in step 2;
[0040] Step 4: Deposit a supporting layer 2-3 on the surface of the CrN transition layer 2-2 obtained in Step 3;
[0041] Step 5: Deposit the functional layer 2-4 on the surface of the supporting layer 2-3 obtained in the step 4 to obtain a die-casting mold with a nanocomposite ceramic coating deposited on the surface of the substrate.
[0042]According to the present invention, pretreatment of the die-casting mold base can be carried out by methods well known in the art, and there is no special limitation. In the present invention, the working surface of the die-c...
Embodiment 1
[0051] The working surface of the die-casting mold base made of H13 (4Cr5MoSiV1) material is polished, and the mold base is degreased, dewaxed, cleaned and dried by ultrasonic cleaning;
[0052] Place the cleaned and dried mold base in the cavity of the vacuum cathode ion plating equipment, heat to 400°C, and vacuumize to 5×10 -3 Pa, feed Ar, keep the air pressure at 1.2Pa, turn on the ion source of the anode layer, the voltage is 550V, the current is 3A, the speed of the substrate holder is 1rpm, the negative bias is -900V, and the bombardment time is 60min;
[0053] After glow cleaning, adjust the vacuum to 0.8Pa, turn on the metal Cr target, keep the bias at -300V, current 75A, and deposit for 10min to obtain a Cr metal bonding layer with a thickness of 120nm;
[0054] After the deposition of the Cr binding layer on the metal surface is completed, the bias voltage is reduced to -150V, and the N 2 , control the air pressure at 0.85Pa, the substrate temperature at 400°C, the...
Embodiment 2
[0059] The working surface of the die-casting mold made of Y10 (4Cr5Mo2MnVSi) material is polished, and the mold substrate is degreased, dewaxed, cleaned and dried by ultrasonic cleaning;
[0060] Place the cleaned and dried mold base in the cavity of the vacuum cathode ion plating equipment, heat to 450 degrees, and vacuumize to 5×10 -3 Pa, feed Ar, keep the air pressure at 1.2Pa, turn on the ion source of the anode layer, the voltage is 500V, the current is 4A, the speed of the substrate holder is 2rpm, the negative bias is -900V, and the bombardment time is 80min;
[0061] After glow cleaning, the vacuum was adjusted to 0.9Pa, the metal Cr target was turned on, the bias voltage was maintained at -300V, the current was 80A, and the deposition was carried out for 8min to obtain a Cr metal interface bonding layer with a thickness of 140nm.
[0062] After the deposition of the Cr binding layer on the metal surface is completed, the bias voltage is reduced to -150V, and the N 2...
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