Selective emitter electrode solar battery manufacturing process combined with reactive ion etching (RIE)

Abstract

The invention relates to the solar battery manufacturing method field, especially relates to a selective emitter electrode solar battery manufacturing process combined with a reactive ion etching (RIE). The method comprises the following steps that: after a surface is pretreated, a silicon chip diffuses so as to form a diffusion layer; a tiny suede is formed on a surface of the silicon chip through etching the reactive ion on the diffusion layer; a barrier layer is printed; a heavily doped region and a low doped region is formed after etching back through a local wet method; finally, an electrode is printed in the heavily doped region; sintering is performed and preparation of a cell sheet is completed. By using the technology provided in the invention, a problem of non-uniform diffusion caused by the RIE can be solved. Simultaneously, a diffusion selectivity emitter electrode technology is combined so as to raise short wave response, further increase light absorption and obtain high photoelectric conversion efficiency.

Description

technical field [0001] The invention relates to the field of solar cell manufacturing methods, in particular to a reactive ion etching texturing combined with selective emitter solar cell manufacturing process. Background technique [0002] Reactive ion etching texturing (RIE) is to form a micro texture of <1um on the surface of the silicon wafer through plasma bombardment and chemical reaction etching to reduce surface reflectivity and increase light absorption. Compared with velvet technology, it can obtain higher photoelectric conversion efficiency. The existing reactive ion etching texturing process is: silicon wafer pretreatment, reactive ion etching (RIE), removal of surface damage layer after etching, followed by diffusion, post-cleaning, and screen printing. Because the suede surface of the RIE process is conical with a size <1um, this suede surface structure will cause uneven diffusion, high local surface diffusion concentration, and high recombination rate, ...

AI Technical Summary

Problems solved by technology

[0003] The technical problem to be solved by the present invention is to provide a reactive ion etching texturing combined with selective emitter solar cell manufacturing process to solve the problem of uneven diffusion, obtain higher short-wave response, and improve photoelectric conversion efficiency

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