99results about "Photometry using wholly visual means" patented technology

The invention relates to a laser facula measuring device and a measuring method thereof. The device consists of a DMD micro-mirror array, a digital camera, an exposure control unit and a picture digital processor. The exposure control unit is provided with two output ends which respectively output signals to control the DMD micro-mirror array and the digital camera; and the input end of the picture digital processor is connected with the video signal output end of the digital camera. In the method, DMD micro-mirror array components are utilized, so the characteristics of an incident light path can be changed at different times and in different regions so as to accurately control the exposure process and obtain a laser beam detection image with high dynamic range; and by means of data processing, diameter, ellipticity, position, center, three-dimensional outline, power, and other parameters of the facula can be obtained. As the whole process happens within a short time, the defect that the position and the energy state of the laser facula changes as time goes by can be avoided, and light beam quality of the laser beam can be more accurately measured.

The present invention belongs to the adaptive optics technical field, and relates to a wavefront reconstruction algorithm under a condition that first six Zernike patterns exist in the subapertures of a Hartmann wavefront detector. According to the ideas of the wavefront reconstruction algorithm, a back camera in the Hartmann detector is arranged on the defocus plane of a microlens array; a light spot is made to be expanded; the sub-wavefronts which go through low-order distortion are obtained through using the light intensity distribution of the light spot. Analog computation is performed on the optical response of the second Zernike pattern to the sixth Zernike pattern according to the subapertures of the Hartmann wavefront detector, which is just indicated by a figure 1 in the descriptions of the invention, and therefore, a subaperture response matrix can be obtained; the Zernike pattern response light spot array of the overall wavefronts can be measured through using a traditional method; the pattern coefficient vector of each sub-wavefront is solved through the subaperture response matrix; each pixel of the overall wavefront response matrix is composed of the pattern coefficient vectors of the sub-wavefronts; and the overall wavefront constructed by using the response matrix can maintain the high resolution of adaptive optical imaging and improve wavefront detection sensitivity.