Flexible energy storage thin film, preparation method thereof and thin film capacitor
A thin film and energy storage technology, applied in the energy field, can solve the problems of insufficient flexibility of energy storage films, achieve good retention rate and stability of binding force, improve energy storage performance, and high breakdown field strength
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[0047] Such as figure 1 As shown, the preparation method of the flexible energy storage film provided by the invention comprises:
[0048] (a), providing a flexible metal substrate 10;
[0049] (b) Depositing and forming a metal film 20 on the flexible metal substrate 10 by using a single metal substance as a target material by using a magnetic filter multi-arc ion plating method;
[0050] (c), using strontium titanate as a target, depositing a strontium titanate prefabricated layer 30 on the metal thin film 20 by magnetron sputtering;
[0051](d), heat-treating the flexible metal substrate 10 deposited with the metal thin film 20 and the strontium titanate prefabricated layer 30, so that the metal atoms in the metal thin film 20 diffuse to the strontium titanate prefabricated layer 30 to obtain the ceramic thin film 31, Wherein, the ceramic thin film 31 includes a diffusion solid solution layer 311 doped with strontium titanate and a strontium titanate layer 312 bonded to t...
Embodiment 1
[0096] With flexible rolled copper foil as the substrate, the thickness is 18 microns, the surface roughness is 0.4 microns, placed in a vacuum chamber, and vacuumed to 3×10 -3 Pa. The vacuum chamber is heated to 150°C, the holding time is 10min, filled with argon gas, the flow rate of argon gas is 30sccm, the Hall ion source is turned on, the voltage of the Hall ion source is set to 1000v, the current is 0.5A, and the copper foil is processed for 1min. The surface tension reaches 60 dynes.
[0097] Close the small gate valve to a vacuum of 2.0×10 -2 Pa, keep the argon gas flow rate at 30 sccm, turn on the magnetic filter multi-arc ion plating power supply, adjust the arc current to 50A, draw the current to 9A, apply a bias voltage of 5V to the flexible rolled copper foil, and use the strontium target as the single metal target, The deposition time is 30s, and a 10nm strontium thin film is formed on the copper foil.
[0098] Turn off the magnetic filter multi-arc ion platin...
Embodiment 2
[0103] With a flexible silver foil as the substrate, the thickness is 12 microns, the surface roughness is 0.5 microns, placed in a vacuum chamber, and evacuated to 3×10 -3 Pa. The vacuum chamber is heated to 200°C, the holding time is 10min, filled with argon gas, the flow rate of argon gas is 30sccm, the Hall ion source is turned on, the voltage of the Hall ion source is set to 1000v, the current is 0.5A, and the treatment is 5min to make the silver foil The surface tension reaches 70 dynes.
[0104] Close the small gate valve to a vacuum of 2.0×10 -2 Pa, keep the argon flow at 30sccm, turn on the magnetic filter multi-arc ion plating power supply, adjust the arc current to 55A, draw the current to 9A, apply a bias voltage of 10V to the flexible silver foil, and use the calcium target as the single metal target, deposit For 60s, a 40nm calcium film is formed on the copper foil.
[0105] Turn off the magnetic filter multi-arc ion plating power supply, increase the argon ga...
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