Preparation method of P-type passivation contact crystalline silicon solar cell
A technology of solar cells and crystalline silicon, which is applied in the field of solar cells and can solve problems such as complex preparation processes
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[0036] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0037] The traditional P-type passivation contact crystalline silicon solar cell preparation process includes texturing, backside polishing, backside deposition of ultra-thin silicon oxide, backside deposition of amorphous silicon, high temperature treatment to crystallize amorphous silicon, front side deposition mask, backside high temperature Boron diffusion, removal of front mask and back borosilicate glass, back deposition mask, front high temperature phosphorus...
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