Fluorocarbon/palladium/magnesium-niobium pentoxide gas-switchable film and preparation method thereof
A technology of niobium pentoxide and light-adjusting thin film, which is applied in the direction of gaseous chemical plating, superimposed layer plating, vacuum evaporation plating, etc., and can solve problems such as corrosion of light-adjusting thin film, reduction of catalytic efficiency, and reduction of pure palladium ratio , to achieve the effect of simple process, high degree of automation and short recovery time
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Embodiment 1
[0044] This embodiment provides a method for preparing a gas-induced dimming film of fluorocarbon / palladium / magnesium-niobium pentoxide, which includes the following steps:
[0045] (1) Use niobium pentoxide powder with a purity (mass fraction) of 99.99% to make a niobium pentoxide target, and add a copper back plate. The same niobium pentoxide target is used in the following examples 2 to 6 ;
[0046] (2) Soak the quartz glass sheet with the prepared cleaning solution for 15 minutes successively, and rinse the quartz glass sheet with deionized water for 1 minute; the cleaning solution is a mixed solution of concentrated sulfuric acid and hydrogen peroxide, and the ratio is 3:1; the cleaned quartz glass The substrate is placed in the magnetron sputtering reaction chamber, and the vacuum system is turned on for vacuuming until the background vacuum is 3×10 -4 Pa;
[0047] (3) Heating the substrate so that the temperature of the substrate is 20-25°C, injecting the working gas ...
Embodiment 2
[0052] This embodiment provides a method for preparing a gas-induced dimming film of fluorocarbon / palladium / magnesium-niobium pentoxide, which includes the following steps:
[0053] (1) Soak the quartz glass sheet with the prepared cleaning solution for 15 minutes successively, and rinse the quartz glass sheet with deionized water for 1 minute; the cleaning solution is a mixed solution of concentrated sulfuric acid and hydrogen peroxide, and the ratio is 3:1; the cleaned quartz glass The substrate is placed in the magnetron sputtering reaction chamber, and the vacuum system is turned on for vacuuming until the background vacuum is 3×10 -4 Pa;
[0054] (2) Heating the substrate so that the temperature of the substrate is 20-25°C, injecting the working gas A, and maintaining the pressure of 0.4-0.6Pa, after the pressure is stable, turn on the power of the palladium, magnesium and niobium pentoxide targets, and turn off each For the baffle in front of the target, pre-sputter to ...
Embodiment 3
[0059] This embodiment provides a method for preparing a gas-induced dimming film of fluorocarbon / palladium / magnesium-niobium pentoxide, which includes the following steps:
[0060] (1) Soak the quartz glass sheet with the prepared cleaning solution for 15 minutes successively, and rinse the quartz glass sheet with deionized water for 1 minute; the cleaning solution is a mixed solution of concentrated sulfuric acid and hydrogen peroxide, and the ratio is 3:1; the cleaned quartz glass The substrate is placed in the magnetron sputtering reaction chamber, and the vacuum system is turned on for vacuuming until the background vacuum is 8×10 -4 Pa;
[0061] (2) Heating the substrate so that the temperature of the substrate is 20-25°C, injecting the working gas A, and maintaining the pressure of 0.4-0.6Pa, after the pressure is stable, turn on the power of the palladium, magnesium and niobium pentoxide targets, and turn off each For the baffle in front of the target, pre-sputter to ...
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Abstract
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