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Nanometer diamond polishing solution and preparation method thereof

A nano-diamond and polishing liquid technology, applied in the polishing field, can solve the problems of poor dispersion and stability of nano-diamond, easy to produce scratches and black spots, and low polishing accuracy, so as to reduce the risk of being scratched and improve the polishing accuracy. , Improve the effect of polishing quality

Inactive Publication Date: 2018-11-23
成都天成鑫钻纳米科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The object of the present invention is to: aim at the problems that the above existing nano-diamond polishing fluid has poor dispersion and stability, and the particles are easy to aggregate, resulting in low polishing precision and easy generation of scratches and black spots in the polishing process. The present invention provides a Nano-diamond polishing liquid and preparation method thereof

Method used

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  • Nanometer diamond polishing solution and preparation method thereof
  • Nanometer diamond polishing solution and preparation method thereof
  • Nanometer diamond polishing solution and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0029] A preparation method for nano-diamond polishing liquid, comprising the following steps:

[0030] (1) Soak the nano-diamond powder in mixed acid for 48h, then ultrasonically for 48h, filter, wash with running water, and dry to obtain the modified nano-diamond with carboxyl group grafted on the surface, wherein the mixed acid is 80% sulfuric acid and mass fraction 75% nitric acid is mixed according to the volume ratio of 1:1;

[0031] The modified nano-diamond of 1wt% surface grafted carboxyl group is mixed with 5wt% glyceryl monostearate, adding mass fraction is 80% sulfuric acid and heating, then carboxyl group and the hydroxyl group reaction of glyceryl monostearate, make modification Nano-diamonds are grafted onto glycerol monostearate;

[0032] (2) Add glyceryl monostearate of grafted modified nano-diamonds to water, then add 0.3wt% polyvinyl alcohol, 0.02wt% benzotriazole and ultrasonically disperse;

[0033] (3) It is obtained by adjusting the pH value with ammon...

Embodiment 2

[0035] A preparation method for nano-diamond polishing liquid, comprising the following steps:

[0036] (1) Soak the nano-diamond powder in mixed acid for 72h, then ultrasonically for 36h, filter, wash with running water, and dry to obtain the modified nano-diamond with carboxyl group grafted on the surface, wherein the mixed acid is 80% sulfuric acid and mass fraction 75% nitric acid is mixed according to the volume ratio of 1:1;

[0037] Mix the modified nano-diamond with 3wt% surface grafted carboxyl group with 7wt% pentaerythritol ester, add sulfuric acid with a mass fraction of 80% and heat, then the carboxyl group reacts with the hydroxyl group of the pentaerythritol ester, so that the modified nano-diamond is grafted on the pentaerythritol ester ;

[0038] (2) Add pentaerythritol ester of grafted modified nano-diamond to water, then add 0.4wt% polyacrylic acid, 0.6wt% sodium polyacrylate, 0.02wt% mercaptobenzothiazole and ultrasonically disperse;

[0039] (3) It is ob...

Embodiment 3

[0041] A preparation method for nano-diamond polishing liquid, comprising the following steps:

[0042] (1) Soak the nano-diamond powder in mixed acid for 72h, then ultrasonic for 48h, filter, wash with running water, and dry to obtain the modified nano-diamond with carboxyl group grafted on the surface, wherein the mixed acid is 80% sulfuric acid and mass fraction 75% nitric acid is mixed according to the volume ratio of 1:1;

[0043] The modified nano-diamond of 5wt% surface grafted carboxyl group is mixed with 10wt% glyceryl monostearate, adding mass fraction is 80% sulfuric acid and heating, then the carboxyl group reacts with the hydroxyl group of glyceryl monostearate to make the modification Nano-diamonds are grafted onto glycerol monostearate;

[0044] (2) Glyceryl monostearate of the grafted modified nano-diamond is added to water, then 1.8wt% polyethylene glycol, 0.02wt% mercaptobenzothiazole are added and ultrasonically dispersed;

[0045] (3) It is obtained by ad...

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Abstract

The invention discloses a nanometer diamond polishing solution and a preparation method thereof. The nanometer diamond polishing solution is prepared from the following components in percentage by weight: 0.5-5 percent of modified nanometer diamond, 4-10 percent of polyol surfactant, 0.1-2 percent of dispersant, 0.02-1 percent of corrosion inhibitor and the balance of pH regulator and water, wherein the modified nanometer diamond is obtained by grafting the surface of nanometer diamond powder with carboxyl groups. For the nanometer diamond polishing solution and the preparation method providedby the invention, the modified nanometer diamond is grafted to the polyol surfactant, so that the modified nanometer diamond is stable in dispersion, ensures the polishing accuracy and remarkably lower the risk that the polishing surface is scratched; in addition, the modified nanometer diamond is difficult to separate the polishing solution, so that the phenomenon that particles fall off to cause the chip cutting speed to drop rapidly and formation of black points on the polishing surface are avoided; and in addition, sedimentation can not occur among the modified nanometer diamond althoughflocculation occurs, and the nanometer diamond polishing solution has the reparability ability and can be applied to the finish polishing field of magnetic heads, artificial crystals, gemstones and the like.

Description

technical field [0001] The invention belongs to the technical field of polishing, and in particular relates to a nano-diamond polishing liquid and a preparation method thereof. Background technique [0002] Nano-diamond powder has the advantages of high hardness, surface group modification, nano-scale size, and excellent mechanochemical properties. Therefore, the polishing liquid prepared by nano-diamond powder abrasive has high polishing efficiency and can reduce the polishing surface material. Weight, reducing material loss, ultra-fine size nano-diamond can ensure the minimum roughness of the polished surface. However, nano-diamond particles have a high specific surface energy, are in a thermodynamically unstable state, and are prone to aggregation and flocculation and sedimentation. The smaller the particle size, the easier it is to aggregate. In the polishing solution prepared by using nano-diamonds, On the one hand, the particle aggregation reduces the polishing precis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 刘欢锐邓文才何昱江
Owner 成都天成鑫钻纳米科技股份有限公司
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