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Photoresist stripping solution composition for LCD manufacturing

A technology of composition and stripper, which is applied in the field of water-based photoresist stripper composition and integrated photoresist stripper composition, and can solve problems such as imperfect photoresist and imperfect stripping of photoresist

Active Publication Date: 2018-04-17
LTC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In addition, in the TFT-LCD aluminum (Al) line film, a degraded photoresist (degenerated) that has undergone a hard baked process (hard baked), an implant process (implant) and a dry etching process (dry etch) in sequence photoresist) needs to be stripped, and where the stripping of the photoresist may not be perfect after the hard bake and dry etch process, sometimes using weakly basic amines to reduce the photoresist removal ability
In Korean Patent No. 10-0950779, tertiary alkanolamines containing water (1% to 50%), aluminum (Al) and copper ( Cu) metal lines are not corroded in solution, however, after hard bake process, implant process and dry etch process, there is a risk of stripping degradation when weakly basic alkanolamines (tertiary alkanolamines) are used. The problem with photoresist imperfections

Method used

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  • Photoresist stripping solution composition for LCD manufacturing
  • Photoresist stripping solution composition for LCD manufacturing
  • Photoresist stripping solution composition for LCD manufacturing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0084] Regarding the evaluation of the volatilization amount of cycloalcohols used

[0085] The stripping agent mixed according to each evaluation condition was placed on a heating plate at 50° C. (the temperature used in the process), and at the same time, the stripping agent was stored for 48 hours, and the volatilization evaporation measured by weight ratio was compared, and also The change ratio of alkanolamine (a main component) and polar organic solvent component was measured under each condition. As materials for comparison with naphthenes, materials having the same molecular weight and composition, and similar boiling points were evaluated, and the main components were analyzed by using gas chromatography.

[0086] As Comparative Example 1 and Comparative Example 2 for cyclic alcohols, linear structure materials having similar chemical formulas (octyl alcohol, decyl alcohol), and materials having similar boiling points were also selected for evaluation.

[0087] From...

Embodiment 2

[0102] Evaluation of Photoresist Stripping for Metal Corrosion and Degradation

[0103] The composition and content of the photoresist stripper are listed in Table 2 below. In addition to the ingredients described in Table 2 below, ultrapure water was introduced at 35% by weight, a transition metal corrosion inhibitor was introduced at 0.05% by weight, and when two types of potential metal and metal oxide corrosion inhibitors were used , one potential metal and metal oxide corrosion inhibitor was introduced at 0.225% by weight of each corrosion inhibitor, and when only one type was used, the weight ratio was 0.05% by weight.

[0104] [Table 2]

[0105]

[0106] MEA: Monoethanolamine

[0107] MIPA: Monoisopropanolamine (Monoisopropanolamine)

[0108] AEE: Aminoethoxyethanol (Aminoethoxyethanol)

[0109] AEEOAP: Aminoethylethanolamine (Aminoethylethanolamine)

[0110] NMP: N-methylpyrrolidone (N-methylpyrrolidone)

[0111] THFA: Tetrahydrofurfuryl alcohol

[0112] GA...

Embodiment 3

[0163] Evaluation of photoresist stripping ability for metal corrosion and degradation as a function of corrosion inhibitor content

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Abstract

The present invention relates to a photoresist stripping solution composition for LCD manufacturing, and to a combined photoresist stripping solution composition capable of being used in all processesfor manufacturing a TFT-LCD. More particularly, the present invention relates to a water-based photoresist stripping solution composition that can be applied to all of transition metal, potential metal, and oxide semiconductor wiring. The water-based photoresist stripping solution composition comprises: (a) a potential metal and metal oxide corrosion inhibitor; (b) a transition metal corrosion inhibitor; (c) a primary alkanolamine; (d) a cyclic alcohol; (e) water; (f) an aprotic polar organic solvent; and (g) a protic polar organic solvent, wherein the photoresist stripping solution composition has an excellent ability to remove a photoresist that has been modified after a hard baked process, an implant process, and a dry etch process have been implemented, can be applied simultaneously to an aluminum (potential metal), copper or silver (transition metal), and metal oxide wiring, and can be introduced in organic film and COA processes.

Description

technical field [0001] The present disclosure relates to a resist stripper composition for manufacturing LCDs, and to an integrated photoresist stripper composition that can be used in all processes of TFT-LCD manufacture. More particularly, the present disclosure relates to an aqueous photoresist stripper composition that can be used for all transition metal, potential metal, and oxide semiconductor lines. Background technique [0002] In a flat panel display (FPD) manufacturing process, a photo-lithography process is widely used to form a constant pattern on a substrate. [0003] This photolithography process mainly consists of a series of processes such as exposure process, dry or wet etching process and ashing process, and after coating and exposing photoresist on the substrate, dry or wet process is performed on it. Etched to form a pattern. Therefore, the photoresist left on the metal line needs to be removed using a photoresist stripper. [0004] To date, photoresi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42H01L21/311H01L21/02
CPCH01L21/31133C11D3/0073C11D7/261C11D7/3218C11D7/5004G03F7/425G03F7/426C11D2111/22H01L21/311C11D3/2068G03F7/32H01L21/0273H01L27/124
Inventor 崔好星柳匡铉裴钟一李钟淳河相求梁惠星M-Y·韩H-J·李
Owner LTC
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