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Growth equipment and growth method for large-size gallium oxide monocrystalline

A gallium oxide, large-scale technology, applied in the direction of single crystal growth, single crystal growth, crystal growth, etc., can solve the problems of exacerbating melt decomposition and volatilization, affecting crystal quality, and covering volatiles, so as to reduce volatilization and decomposition , Stable growth interface, small buoyancy and convection

Inactive Publication Date: 2018-01-05
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This is exactly the growth of the guided mode method, and the disadvantage of the guided mode method is very obvious: the mold of the guided mode method is generally higher than the liquid level in the crucible, and when the top of the mold reaches the crystal growth temperature, the temperature of the melt in the crucible is generally higher than that of the crucible. The melting point is tens of degrees, which intensifies the decomposition and volatilization of the melt; the guided mode growth method needs to observe the crystal growth through the observation window, and the observation window is often blocked by volatiles and loses its function. The β- Ga 2 o 3 Single crystal, common problems such as bubbles, growth streaks, cleavage cracking, polycrystalline, etc., seriously affect the crystal quality

Method used

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  • Growth equipment and growth method for large-size gallium oxide monocrystalline
  • Growth equipment and growth method for large-size gallium oxide monocrystalline

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Experimental program
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Effect test

Embodiment 1

[0031] like figure 1 As shown, a large-size gallium oxide single crystal growth equipment, including zirconia insulation brick 1, quartz cylinder 2, water-cooled copper electrode 3, iridium gold crucible 4, heat exchanger 6, infrared thermometer 7, the described The iridium crucible 4 is placed in the crystal growth furnace chamber formed by the zirconia insulating brick 1, and the outer side of the zirconia insulating brick 1 is provided with a quartz cylinder 2 and a water-cooled copper electrode 3 in turn, and the heat exchanger 6 is placed in the iridium crucible 4. At the bottom, the infrared thermometer 7 is connected to the iridium crucible 4, and the iridium crucible 4 is filled with a gallium oxide solution 8 and a seed crystal 5. The side wall of the iridium crucible 4 is provided with an infrared temperature measuring point, which is connected to an infrared thermometer 7 for monitoring the temperature of the crucible material and crystal growth. The heat exchanger...

Embodiment 2

[0044] The angle a between the inner wall of the iridium crucible and the horizontal plane is: 30 degrees

[0045] The heating method of the equipment is induction heating; the power frequency is 20khz.

[0046] Wherein, the annealing treatment of the crystal is performed, and the annealing time can be selected according to the actual situation, such as 50h, 200h, and the like.

[0047] All the other are with embodiment 1.

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Abstract

The invention relates to a piece of growth equipment and a growth method for large-size gallium oxide monocrystalline. The equipment comprises the following components: a zirconia insulating brick (1), a quartz cylinder (2), a water cooling copper electrode (3), an iraurita crucible (4), a heat exchanger (6), and an infrared thermometer (7). The method comprises the following steps: the iraurita crucible (4) is placed in the crystal growth furnace cavity formed by the zirconia insulating brick (1), the outside of the zirconia insulating brick (1) is provided with the quartz cylinder (2) and the water cooling copper electrode (3) in order, the heat exchanger (6) is placed at the bottom of the iraurita crucible (4), the infrared thermometer (7) is connected to the iraurita crucible (4), andthe iraurita crucible (4) contains a gallium oxide solution (8) and seed crystal (5). Compared with the prior art, heat exchange method is used for growing crystal, the efficiency is improved, and production cost is reduced; at the same time, grown crystal has the advantages of excellent quality, little stress, low dislocation density, good crystal perfection and optical homogeneity, improved utilization rate of the gallium oxide material, and simplified processing operation.

Description

technical field [0001] The invention relates to a growth method and a growth device of a gallium oxide single crystal, in particular to a large-size, high-quality, gallium oxide single crystal growth method and a growth device, belonging to the technical field of crystal growth. Background technique [0002] β-Gallium Oxide (β-Ga 2 o 3 ) single crystal is a new type of wide bandgap oxide semiconductor material, which can be used as high-power components, with high breakdown voltage and large current density, and can also be used for LED chips, various sensor components and imaging components Wait. Among them, β-Ga 2 o 3 Single crystal as the substrate material of GaN is the most promising application. It combines the conductivity of silicon carbide and the light transmission of sapphire, and the (100) crystal plane has zero mismatch with the GaN lattice after surface nitriding reconstruction. . β-Ga 2 o 3 It has the following advantages: (1) It has electrical conduct...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/16C30B27/00
Inventor 王东海徐军唐慧丽罗平何诺天郭超李秋王庆国
Owner TONGJI UNIV
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