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Femtosecond laser preparation method for uniform and thick mesoporous titanium oxide nanometer particle film

A nanoparticle and thin film preparation technology, applied in nanotechnology, ion implantation plating, coating and other directions, can solve the problems of low film adhesion, complicated operation, etc., and achieve the convenience of doping or compounding other materials and the particle deposition efficiency Increase and improve the effect of single pulse energy and pulse width

Inactive Publication Date: 2016-11-23
TIANJIN UNIV OF TECH & EDUCATION TEACHER DEV CENT OF CHINA VOCATIONAL TRAINING & GUIDANCE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Traditional application of TiO in photochemical water splitting for hydrogen production 2 Nanoparticle films are usually prepared by chemical methods such as sol-gel. The particle size, particle spacing and composite material type of nanoparticles have a great influence on the experimental results, and there are disadvantages such as low film adhesion and complicated operation.

Method used

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  • Femtosecond laser preparation method for uniform and thick mesoporous titanium oxide nanometer particle film
  • Femtosecond laser preparation method for uniform and thick mesoporous titanium oxide nanometer particle film
  • Femtosecond laser preparation method for uniform and thick mesoporous titanium oxide nanometer particle film

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Effect test

Embodiment 1

[0040] Using a femtosecond laser sputtering deposition device ( figure 1 ), using a Nd:Glass femtosecond frequency-doubled pulse laser with a pulse width of 300fs, a center wavelength of 537nm, a repetition rate of 33Hz, and a single pulse energy of 0.8mJ. Energy attenuator, gold-plated mirror, plano-convex focusing objective lens and silicon oxide transmission window in the vacuum target chamber, finally focusing on the target surface at an angle of 45 degrees vertical to the target surface, with an air pressure of 10 － 7 mbar, the laser beam is controlled by computer software to sweep the gold-plated surface within 1cm outside the center point of the rutile phase titanium oxide (99.99%) target surface, and the marble substrate with a diameter of 1cm is used as the substrate, and the distance between the substrate and the target is 35cm. The energy flux density is about 0.36J / cm 2 The laser beam irradiates the target, and the deposition time is 10 seconds. Titanium oxide na...

Embodiment 2

[0042] Using a femtosecond laser sputtering deposition device ( figure 1 ), using a Nd:Glass femtosecond frequency-doubled pulse laser with a pulse width of 300fs, a center wavelength of 537nm, a repetition rate of 33Hz, and a single pulse energy of 0.8mJ. Energy attenuator, gold-plated mirror, plano-convex focusing objective lens and silicon oxide transmission window in the vacuum target chamber, finally focusing on the target surface at an angle of 45 degrees vertical to the target surface, with an air pressure of 10 － 7 mbar, the laser beam is controlled by computer software to sweep the gold-plated surface within 1cm outside the center point of the rutile phase titanium oxide (99.99%) target surface, and the 0.5×1cm titanium foil after physical grinding and polishing is used as the substrate, the substrate and the target The distance is 35cm, and the energy flux density is 1.4J / cm 2 The laser beam irradiates the target, and the nanoparticles are sputtered and deposited f...

Embodiment 3

[0044] Using a femtosecond laser sputtering deposition device ( figure 1 ), using a Nd:Glass femtosecond frequency-doubled pulse laser with a pulse width of 300fs, a center wavelength of 537nm, a repetition rate of 33Hz, and a single pulse energy of 0.8mJ. Energy attenuator, gold-plated mirror, plano-convex focusing objective lens and silicon oxide transmission window in the vacuum target chamber, finally focusing on the target surface at an angle of 45 degrees vertical to the target surface, with an air pressure of 10 － 7 mbar, the laser beam is controlled by computer software to sweep the gold-plated surface within 1cm outside the center point of the rutile phase titanium oxide (99.99%) target surface, and the 0.5×1cm titanium foil after physical grinding and polishing is used as the substrate, the substrate and the target The distance is 35cm, and the energy flux density is 1.4J / cm 2 The laser beam irradiates the target, the nanoparticles are sputtered and deposited for 3...

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Abstract

The invention discloses a preparation method of a mesoporous nanometer particle film and belongs to a technology for preparing films with special properties through femtosecond laser deposition. According to the preparation method, high-purity titanium oxide serves as a target, a laser vacuum deposition device characterized in that the pulse width is 300 femtoseconds, the center wavelength is 537 nanometers, the frequency is 33 hertz, and the maximum single pulse energy is 0.9 millijoules is adopted, and preparation of the uniform and thick mesoporous titanium oxide nanometer particle film is achieved. The preparation method is characterized in that when the deposition time is short, the average dimension of nanometer particles is about 20 nanometers; and after deposition is conducted for a long time, the cluster phenomenon is generated in particles, the film is thick, and the mesoporous clearance is obvious. The preparation method has the beneficial effects that the film parameters can be changed by controlling the pulse energy and the deposition time; the difference change of the film crystallization morphology can be achieved by controlling the target chamber air pressure and the air inflation type; doping or compounding of other materials is facilitated; the high solar conversion efficiency per unit thickness is high; and research on application of the different types of films which have the special properties and are prepared through femtosecond laser deposition to hydrogen production is facilitated.

Description

technical field [0001] The invention relates to a method for preparing a semiconductor thin film, in particular to a method for preparing a mesoporous nanoparticle thin film by femtosecond laser deposition. Background technique [0002] Titanium oxide (TiO 2 ) nanomaterials have shown high catalytic reaction ability and chemical stability in splitting water to produce hydrogen (Water Splitting). Using TiO 2 The nanoparticle film can realize the photochemical decomposition of water to produce hydrogen under sunlight. in TiO 2 The co-doping of gold (Au), cadmium sulfide (CdS), nitrogen (N) and rubidium (Nd) in the nanoparticle film, and the doping of cadmium sulfide (CdS) into platinum (Pt) and tungsten carbide (WC) can be further improved. Fully absorb the sunlight energy, realize the improvement of light utilization rate and hydrogen production efficiency. Traditional application of TiO in photochemical water splitting for hydrogen production 2 Nanoparticle films are u...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/28C23C14/08B82Y40/00
Inventor 倪晓昌王宣李彤徐丽娟
Owner TIANJIN UNIV OF TECH & EDUCATION TEACHER DEV CENT OF CHINA VOCATIONAL TRAINING & GUIDANCE
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