Cu doped Fe-N soft magnetic thin film and preparation method thereof
A soft magnetic thin film, fe-n technology, applied in the application of magnetic film to substrate, magnetic layer, inorganic material magnetism, etc., can solve the problems of poor thermal stability of magnetic properties, reduction of coercive force, and incompatibility of saturation magnetization To achieve low coercive force, high saturation magnetization and easy composition control
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[0024] The preparation method of Cu-doped Fe-N soft magnetic film adopts the FJL-560a dual-chamber magnetron and ion beam composite sputtering deposition system, and prepares Fe-N film by magnetron sputtering double-target co-sputtering. The sputtering process In, pass into Ar and N 2 The mixed gas, adjust the process parameters, obtain Fe-N soft magnetic film with low coercive force and high saturation magnetization. It mainly includes the following steps:
[0025] 1) Cleaning of the substrate material: first use acetone to ultrasonically clean to remove surface organic matter; then use anhydrous ethanol to ultrasonically clean to remove surface impurities (dust, cotton fibers, etc.), and finally blow dry with nitrogen; make sure the surface of the substrate material is clean Finally, put it into the designated sample holder, press it tightly with the pins around it, turn the sample holder upside down, and shake it slightly. After confirming that it is firm, put the sample h...
Embodiment 1
[0032] Both Fe and Cu targets are sputtered vertically, the sample is located directly above the Fe target, and Cu atoms are scattered and doped. Fe adopts radio frequency incidence, and the power is 100W, and Cu adopts direct current incidence, and the power is 30W. The sample stage bias for magnetron sputtering was 0V. The sputtering atmosphere is Ar and N 2 The flow ratio is 30:0.25, and the sputtering pressure is 0.5Pa. The sputtering time was 5 minutes. The obtained composition is (Fe 67 N 33 ) 89 Cu 11 film. The film thickness is 93nm, the coercive force is 1.65Oe, the saturation magnetization is 1675emu / cc, and it is stable in the temperature range of 0-450°C.
Embodiment 2
[0034] Both Fe and Cu targets are sputtered vertically, the sample is located directly above the Fe target, and Cu atoms are scattered and doped. Fe adopts radio frequency incidence, and the power is 200W, and Cu adopts direct current incidence, and the power is 60W. The sample stage bias for magnetron sputtering was -50V. The sputtering atmosphere is Ar and N 2 The flow ratio is 30:0.25, and the sputtering pressure is 0.5Pa. The sputtering time was 10 minutes. The obtained composition is (Fe 72 N 28 ) 83 Cu 17 film. The film thickness is 205nm, the coercive force is 8.3Oe, the saturation magnetization is 1364emu / cc, and it is stable in the temperature range of 0-600°C.
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