High-dispersity acidic copper plating additive as well as preparation method and application thereof
An acid copper plating, high dispersion technology, applied in printed circuit manufacturing, electrical connection formation of printed components, electrical components, etc. Effects of electrical continuity, bright copper layer, and simple composition
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[0061] A highly dispersed acid copper plating additive, its composition is as follows:
[0062] Divalent sulfide main brightener 1.5g / L
[0063] Polyethylene glycol 1000015g / L
[0064] Poly(ethylene glycol-propylene glycol) monomethyl ether 50g / L
[0065] Benzyltriethylammonium chloride 1g / L
[0066] Sulfuric acid 10ml / L
[0067] Formaldehyde 1ml / L
[0068] The balance is deionized water;
[0069] Wherein, the divalent sulfide main brightener is a mixture of sodium polydithiodipropane sulfonate and phenyl polydithiodipropane sodium sulfonate.
[0070] A kind of copper plating liquid that adds highly dispersed acidic copper plating additive, its component is as follows:
[0071] Copper sulfate pentahydrate 68g / L
[0072] Sulfuric acid 210g / L
[0074] Highly dispersed acidic copper plating additive 5ml / L
[0075] A method for applying highly dispersed acidic copper plating additives to the electroplating of via holes in printed circuit boards,...
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