Heterojunction high electron mobility spinning field effect transistor and manufacturing method
A high electron mobility, field effect transistor technology, used in semiconductor/solid state device manufacturing, circuits, electrical components, etc. The effect of optimizing the spin polarizability
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0029] The technical solutions of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments.
[0030] figure 1 It is a schematic diagram of the heterojunction high electron mobility spin field effect transistor of the present invention, as shown in the figure, specifically including 3C-SiC drain region 1, 3C-SiC source region 2, 3C-SiC channel region 3, Schottky Contact the gate electrode 4 , the Si substrate 5 , the drain 6 , the source 7 and the SiN isolation layer 8 .
[0031] The 3C-SiC drain region 1, the 3C-SiC source region 2, and the 3C-SiC channel region 3 are located on the Si substrate 5; the source electrode 7 is located on the 3C-SiC source region 2, and the Schottky contact gate electrode 4 is located on the 3C-SiC On the SiC channel region 3, the drain 6 is located on the 3C-SiC drain region 1; the SiN isolation layer 8 is located between the source 7 and the Schottky contact gate electrode 4, an...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com