Heterojunction high-electronic-mobility spin field effect transistor and fabrication method thereof
A high electron mobility, field effect transistor technology, used in semiconductor/solid-state device manufacturing, circuits, electrical components, etc. The effect of optimizing the spin polarizability
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[0029] The technical solutions of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments.
[0030] figure 1 It is a schematic diagram of the heterojunction high electron mobility spin field effect transistor of the present invention, as shown in the figure, specifically including 6H-SiC drain region 1, 6H-SiC source region 2, 6H-SiC channel region 3, Schottky Contact gate electrode 4 , 4H-SiC substrate 5 , drain 6 , source 7 and SiN isolation layer 8 .
[0031] The 6H-SiC drain region 1, the 6H-SiC source region 2, and the 6H-SiC channel region 3 are located on the 4H-SiC substrate 5; the source electrode 7 is located on the 6H-SiC source region 2, and the Schottky contact gate electrode 4 is located on the On the 6H-SiC channel region 3, the drain 6 is located on the 6H-SiC drain region 1; the SiN isolation layer 8 is located on the source 7 and the Schottky contact gate electrode 4, and the Schottky contac...
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